Inventor
HANAWA RYOTARO
JP13 patents
Patents
13 patentsUS5792585AAug 11, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO7 citations73
US5736292AApr 7, 1998
Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
SUMITOMO CHEMICAL CO9 citations73
US5587492ADec 24, 1996
Polyhydric phenol compound and positive resist composition comprising the same
SUMITOMO CHEMICAL CO4 citations73
US5436107AJul 25, 1995
Positive resist composition
SUMITOMO CHEMICAL CO12 citations73
US5362598ANov 8, 1994
Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
SUMITOMO CHEMICAL CO7 citations73
US5198323AMar 30, 1993
Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component
SUMITOMO CHEMICAL CO7 citations72
US5218136AJun 8, 1993
Styryl compounds, process for preparing the same and photoresist compositions comprising the same
SUMITOMO CHEMICAL CO9 citations70
US5783355AJul 21, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO1 citations62
US5354644AOct 11, 1994
Photoresist compositions comprising styryl compound
SUMITOMO CHEMICAL CO2 citations62
US5336583AAug 9, 1994
Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone
SUMITOMO CHEMICAL CO5 citations62
US5283324AFeb 1, 1994
Process for preparing radiation sensitive compound and positive resist composition
SUMITOMO CHEMICAL CO6 citations62
US6383708B1May 7, 2002
Positive resist composition
SUMITOMO CHEMICAL CO1 citations52
US5714620AFeb 3, 1998
Polyhydric phenol compound and positive resist composition comprising the same
SUMITOMO CHEMICAL CO0 citations51