Inventor

OGLE ROBERT B

US29 patents

⚠️ This page may combine multiple inventors who share the name “OGLE ROBERT B”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OGLE ROBERT B

ADVANCED MICRO DEVICES INC

Use of high-K dielectric material in modified ONO structure for semiconductor devices

Use of high-k dielectric materials in modified ONO structure for semiconductor devices

Preparation of composite high-K/standard-K dielectrics for semiconductor devices

High temperature oxide deposition process for fabricating an ONO floating-gate electrode in a two bit EEPROM device

In-situ monitoring during laser thermal annealing

Partial recrystallization of source/drain region before laser thermal annealing

Laser thermal annealing methods for flash memory devices

Post silicide laser thermal annealing to avoid dopant deactivation

Reduced dopant deactivation of source/drain extensions using laser thermal annealing

Laser thermal oxidation to form ultra-thin gate oxide

Method of fabrication SOI devices with accurately defined monocrystalline source/drain extensions

Formation of deep amorphous region to separate junction from end-of-range defects

Nitridation process for fabricating an ONO floating-gate electrode in a two-bit EEPROM device

Preparation of composite high-K/standard-K dielectrics for semiconductor devices

Process for fabricating an ONO floating-gate electrode in a two-bit EEPROM device using rapid-thermal-chemical-vapor-deposition

Method of making a memory cell with polished insulator layer

End-of-range defect minimization in semiconductor device

Polysilicon tilting to prevent geometry effects during laser thermal annealing

Tuning absorption levels during laser thermal annealing

Scanning laser thermal annealing

Low-temperature post-dopant activation process

Low nisi/si interface contact resistance with preamorphizing and laser thermal annealing

Multilayer anti-reflective coating for semiconductor lithography

Nitriding pretreatment of ONO nitride for oxide deposition

Method and system for reducing ARC layer removal by condensing the ARC layer

Localized halo implant region formed using tilt pre-amorphization implant and laser thermal anneal

Oxidizing pretreatment of ONO layer for flash memory

SPANSION LLC

Method for forming memory array bitlines comprising epitaxially grown silicon and related structure

Non-volatile memory device with improved erase speed