Inventor

MATSUTANI HIROSHI

JP17 patents

⚠️ This page may combine multiple inventors who share the name “MATSUTANI HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MATSUTANI HIROSHI

HITACHI CHEMICAL CO LTD

Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating

Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component

Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation

Sulfur-containing phenolic resin, process for preparing the same, phenol derivatives having thioether structure or disulfide structure, process for preparing the same and epoxy resin composition and adhesive

Disulfide-containing phenolic resin as curing agent for epoxy resin

Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device

Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component

Aromatic polyketone, method of producing the same, aromatic polyketone composition, aromatic polyketone film, optical element, and image display apparatus

Method of manufacturing aromatic polyketone film, aromatic polyketone film, substrate provided with aromatic polyketone film, optical element, and image display device

Polyketone composition including epoxy compound, cured polyketone, optical element, and image display device

MATSUTANI HIROSHI

Positive-type photosensitive resin composition, method for producing resist pattern, and electronic component

Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device

Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device

HITACHI CHEM DUPONT MICROSYS

Positive photosensitive resin composition, method for forming pattern, and electronic part

Positive photosensitive resin composition, method for forming pattern, and electronic part

KURITA WATER IND LTD

Photolytic device for breakdown of organic chlorine compounds

TANIMOTO AKITOSHI

Positive photosensitive resin composition, method of creating resist pattern, and electronic component