Inventor
MALHOTRA SANDRA
US33 patents
⚠️ This page may combine multiple inventors who share the name “MALHOTRA SANDRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTERMOLECULAR INC
12 patentsUS7824935B2Nov 2, 2010
Methods of combinatorial processing for screening multiple samples on a semiconductor substrate
INTERMOLECULAR INC25 citations92
US8679939B2Mar 25, 2014
Manufacturable high-k DRAM MIM capacitor structure
INTERMOLECULAR INC6 citations84
US7927947B2Apr 19, 2011
Methods for depositing high-K dielectrics
INTERMOLECULAR INC10 citations84
US7968452B2Jun 28, 2011
Titanium-based high-K dielectric films
INTERMOLECULAR INC6 citations73
US8652927B2Feb 18, 2014
Integration of non-noble DRAM electrode
INTERMOLECULAR INC5 citations71
US8829647B2Sep 9, 2014
High temperature ALD process for metal oxide for DRAM applications
INTERMOLECULAR INC2 citations63
US8476141B2Jul 2, 2013
High performance dielectric stack for DRAM capacitor
INTERMOLECULAR INC3 citations63
US8901708B2Dec 2, 2014
Yttrium and titanium high-k dielectric films
INTERMOLECULAR INC2 citations62
US9178010B2Nov 3, 2015
Adsorption site blocking method for co-doping ALD films
INTERMOLECULAR INC1 citations52
US8900418B2Dec 2, 2014
Yttrium and titanium high-k dielectric films
INTERMOLECULAR INC0 citations52
US8524528B2Sep 3, 2013
Methods for forming resistive-switching metal oxides for nonvolatile memory elements
INTERMOLECULAR INC0 citations52
US7884036B1Feb 8, 2011
Methods for treating substrates in preparation for subsequent processes
INTERMOLECULAR INC0 citations52
MALHOTRA SANDRA
7 patentsUS8440537B1May 14, 2013
Adsorption site blocking method for co-doping ALD films
MALHOTRA SANDRA6 citations84
US8765570B2Jul 1, 2014
Manufacturable high-k DRAM MIM capacitor structure
MALHOTRA SANDRA7 citations83
US8435854B1May 7, 2013
Top electrode templating for DRAM capacitor
MALHOTRA SANDRA11 citations83
US8415227B2Apr 9, 2013
High performance dielectric stack for DRAM capacitor
MALHOTRA SANDRA5 citations83
US8574998B2Nov 5, 2013
Leakage reduction in DRAM MIM capacitors
MALHOTRA SANDRA7 citations82
US8563392B2Oct 22, 2013
Method of forming an ALD material
MALHOTRA SANDRA2 citations62
US8541282B2Sep 24, 2013
Blocking layers for leakage current reduction in DRAM devices
MALHOTRA SANDRA0 citations51
CHEN HANHONG
5 patentsUS8815677B2Aug 26, 2014
Method of processing MIM capacitors to reduce leakage current
CHEN HANHONG5 citations73
US8828821B2Sep 9, 2014
Fabrication of semiconductor stacks with ruthenium-based materials
CHEN HANHONG5 citations72
US8551851B2Oct 8, 2013
Titanium-based high-K dielectric films
CHEN HANHONG2 citations61
US8574997B2Nov 5, 2013
Method of using a catalytic layer to enhance formation of a capacitor stack
CHEN HANHONG0 citations52
US8530322B2Sep 10, 2013
Method of forming stacked metal oxide layers
CHEN HANHONG0 citations52
HASHIM IMRAN
4 patentsUS8278735B2Oct 2, 2012
Yttrium and titanium high-k dielectric films
HASHIM IMRAN10 citations83
US8900422B2Dec 2, 2014
Yttrium and titanium high-K dielectric film
HASHIM IMRAN0 citations51
US8821795B2Sep 2, 2014
Combinatorial screening method and apparatus
HASHIM IMRAN0 citations50
US8815157B2Aug 26, 2014
Combinatorial screening methods and apparatus
HASHIM IMRAN0 citations50