Inventor

CHO HAN-KU

KR35 patents

⚠️ This page may combine multiple inventors who share the name “CHO HAN-KU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHO HAN-KU

SAMSUNG ELECTRONICS CO LTD

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

Semiconductor memory device having storage node electrodes offset from each other

Method of forming fine patterns of semiconductor device

Method of manufacturing a mask

Method of manufacturing mask

Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method

System and method correcting optical proximity effect using pattern configuration dependent OPC models

Mask for correcting optical proximity effect

Method for cleaning substrate having exposed silicon and silicon germanium layers and related method for fabricating semiconductor device

Method for manufacturing semiconductor device with contact body extended in direction of bit line

Reflective photomask and method of fabricating the same

Semiconductor devices having Fin-type active areas and methods of manufacturing the same

Polymer, top coating layer, top coating composition and immersion lithography process using the same

Method of manufacturing mask for correcting optical proximity effect

Flash memory device using double patterning technology and method of manufacturing the same

Method of forming a mask structure and method of forming a minute pattern using the same

Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same

Method of forming trench in semiconductor device

Semiconductor device having anti-reflective cap and spacer, method of manufacturing the same, and method of manufacturing photoresist pattern using the same

Semiconductor memory devices including offset bit lines

Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same

Semiconductor memory devices including diagonal bit lines

Optical masks and methods for measuring aberration of a beam

Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key

Optical masks and methods for measuring aberration of a beam

Photosensitive polymer and photoresist composition having the same

Semiconductor memory devices including offset active regions

Photomask for measuring lens aberration, method of its manufacture, and method of its use

DRAM devices having an increased density layout

Method of forming a semiconductor device

Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same

KOH CHA-WON

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

KIM HYUN-WOO

Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method

HAH JUNG-HWAN

Oligomer probe array and method of producing the same