Inventor

CHENG CHUN-FAI

CA50 patents

⚠️ This page may combine multiple inventors who share the name “CHENG CHUN-FAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHENG CHUN-FAI

TAIWAN SEMICONDUCTOR MFG CO LTD

Gate structures for semiconductor devices

Method and structure for gate-all-around devices

Gate structures for semiconductor devices

Gate dielectric preserving gate cut process

Cutting metal gates in fin field effect transistors

Gate dielectric preserving gate cut process

Cutting metal gates in fin field effect transistors

Gate structures for semiconductor devices

Gate dielectric preserving gate cut process

Strained structure of a semiconductor device

Gate dielectric preserving gate cut process

Multi-gate devices with reduced contact resistance and methods of forming the same

Semiconductor devices and methods of fabricating the same

Strained structure of a semiconductor device

Cutting metal gates in fin field effect transistors

Method of manufacturing strained source/drain structures

Techniques providing high-k dielectric metal gate CMOS

Semiconductor device structure and method for forming the semiconductor device structure

Strained asymmetric source/drain

Strained-channel semiconductor device fabrication

CHENG CHUN-FAI

Semiconductor device and method of manufacturing the same

Transistors having a composite strain structure, integrated circuits, and fabrication methods thereof

Strained structure of a p-type field effect transistor

Semiconductor device and method of manufacturing the same

Strained asymmetric source/drain

Strained-channel semiconductor device fabrication

Semiconductor device and fabrication method thereof

Multi-strained source/drain structures

Method and apparatus for gray-scale gamma correction for electroluminescent displays

TAIWAN SEMICONDUCTOR MFG

Integrated circuit device with well controlled surface proximity and method of manufacturing same

Method of manufacturing strained source/drain structures

Techniques providing high-k dielectric metal gate CMOS

Method of manufacturing strained source/drain structures

Strained semiconductor device with recessed channel

Gate structure having lightly doped region

Integrated circuit device with well controlled surface proximity and method of manufacturing same

High performance strained source-drain structure and method of fabricating the same

TSAI MING-HUAN

Source and drain feature profile for improving device performance and method of manufacturing same

Method of manufacturing integrated circuit device with well controlled surface proximity

Integrated circuit device with well controlled surface proximity and method of manufacturing same

Source and drain feature profile for improving device performance

IFIRE TECHNOLOGY INC

Energy efficient resonant switching electroluminescent display driver

Energy efficient grey scale driver for electroluminescent displays

FUNG KA-HING

Self-aligned two-step STI formation through dummy poly removal

LU WEI-YUAN

Techniques providing high-k dielectric metal gate CMOS

NIEH CHUN-FENG

Method of manufacturing strained source/drain structures

FAN WEI-HAN

Facet-free semiconductor device

SUNG HSUEH-CHANG

High performance strained source-drain structure and method of fabricating the same

HING FUNG KA

Method for fabricating a gate structure

IFIRE IP CORP

Energy efficient column driver for electroluminescent displays