P

Inventor

HIRAYAMA TAKU

JP41 patents
⚠️ This page may combine multiple inventors who share the name “HIRAYAMA TAKU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

23 patents
US7264918B2Sep 4, 2007

Resist composition for liquid immersion exposure process and method of forming resist pattern therewith

TOKYO OHKA KOGYO CO LTD69 citations97
US7504196B2Mar 17, 2009

Positive resist composition, method for resist pattern formation and compound

TOKYO OHKA KOGYO CO LTD21 citations92
US7371510B2May 13, 2008

Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD44 citations92
US7527909B2May 5, 2009

Resist composition

TOKYO OHKA KOGYO CO LTD9 citations84
US7501220B2Mar 10, 2009

Resist composition

TOKYO OHKA KOGYO CO LTD9 citations84
US7541138B2Jun 2, 2009

Resist composition

TOKYO OHKA KOGYO CO LTD6 citations73
US5738968AApr 14, 1998

Positive photoresist composition

TOKYO OHKA KOGYO CO LTD8 citations73
US10324377B2Jun 18, 2019

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD2 citations72
US10101658B2Oct 16, 2018

Resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD6 citations72
US9816003B2Nov 14, 2017

Method of producing structure containing phase-separated structure

TOKYO OHKA KOGYO CO LTD2 citations72
US7851129B2Dec 14, 2010

Resist composition, resist pattern forming method and compound

TOKYO OHKA KOGYO CO LTD2 citations63
US7682770B2Mar 23, 2010

Resist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD2 citations62
US7943284B2May 17, 2011

Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations52
US7923192B2Apr 12, 2011

Base material for pattern-forming material, positive resist composition and method of resist pattern formation

TOKYO OHKA KOGYO CO LTD1 citations52
US7901865B2Mar 8, 2011

Resist composition and process for formation of resist patterns

TOKYO OHKA KOGYO CO LTD1 citations52
US7862981B2Jan 4, 2011

Compound, positive resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD1 citations52
US8017300B2Sep 13, 2011

Compound, positive resist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations42
US7897319B2Mar 1, 2011

Positive resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations42
US7648816B2Jan 19, 2010

Positive resist composition, method for forming resist pattern and compound

TOKYO OHKA KOGYO CO LTD0 citations42
US10100221B2Oct 16, 2018

Method of producing structure containing phase-separated structure, block copolymer composition, and organic solvent used for block copolymer composition

TOKYO OHKA KOGYO CO LTD0 citations41
US10066096B2Sep 4, 2018

Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure

TOKYO OHKA KOGYO CO LTD0 citations41
US7981588B2Jul 19, 2011

Negative resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations41
US7960089B2Jun 14, 2011

Compound, method for producing same, positive resist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations40

HONDA MOTOR CO LTD

11 patents

MERCK PATENT GMBH

2 patents

HIROSAKI TAKAKO

2 patents

MITSUBISHI HEAVY IND LTD

1 patent

SHIONO DAIJU

1 patent

HIRAYAMA TAKU

1 patent