P

Inventor

CLEVENGER LAWRENCE

US27 patents
⚠️ This page may combine multiple inventors who share the name “CLEVENGER LAWRENCE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

24 patents
US7531407B2May 12, 2009

Semiconductor integrated circuit devices having high-Q wafer backside inductors and methods of fabricating same

IBM61 citations98
US6700203B1Mar 2, 2004

Semiconductor structure having in-situ formed unit resistors

IBM28 citations93
US8024012B2Sep 20, 2011

Intelligent wireless power charging system

IBM37 citations92
US7851321B2Dec 14, 2010

Semiconductor integrated circuit devices having high-Q wafer back-side capacitors

IBM16 citations92
US7657995B2Feb 9, 2010

Method of fabricating a microelectromechanical system (MEMS) switch

IBM29 citations92
US7473979B2Jan 6, 2009

Semiconductor integrated circuit devices having high-Q wafer back-side capacitors

IBM18 citations92
US7348870B2Mar 25, 2008

Structure and method of fabricating a hinge type MEMS switch

IBM21 citations92
US7312529B2Dec 25, 2007

Structure and method for producing multiple size interconnections

IBM36 citations92
US7052621B2May 30, 2006

Bilayered metal hardmasks for use in Dual Damascene etch schemes

IBM15 citations92
US6777286B2Aug 17, 2004

Compact SRAM cell incorporating refractory metal-silicon-nitrogen resistive elements and method for fabricating

IBM18 citations92
US7749778B2Jul 6, 2010

Addressable hierarchical metal wire test methodology

IBM17 citations84
US7241681B2Jul 10, 2007

Bilayered metal hardmasks for use in dual damascene etch schemes

IBM13 citations83
US7091542B1Aug 15, 2006

Method of forming a MIM capacitor for Cu BEOL application

IBM15 citations83
US6545339B2Apr 8, 2003

Semiconductor device incorporating elements formed of refractory metal-silicon-nitrogen and method for fabrication

IBM8 citations74
US6541331B2Apr 1, 2003

Method of manufacturing high dielectric constant material

IBM12 citations74
US6524908B2Feb 25, 2003

Method for forming refractory metal-silicon-nitrogen capacitors and structures formed

IBM6 citations74
US6268293B1Jul 31, 2001

Method of forming wires on an integrated circuit chip

IBM8 citations70
US6831369B2Dec 14, 2004

Semiconductor structure having in-situ formed unit resistors and method for fabrication

IBM1 citations63
US6828232B2Dec 7, 2004

Semiconductor structure having in-situ formed unit resistors and method for fabrication

IBM4 citations63
US6794226B2Sep 21, 2004

Semiconductor device incorporating elements formed of refractory metal-silicon-nitrogen and method for fabrication

IBM3 citations63
US6624526B2Sep 23, 2003

Compact SRAM cell incorporating refractory metal-silicon-nitrogen resistive elements and method for fabricating

IBM3 citations63
US7329600B2Feb 12, 2008

Low dielectric semiconductor device and process for fabricating the same

IBM1 citations52
US6707097B2Mar 16, 2004

Method for forming refractory metal-silicon-nitrogen capacitors and structures formed

IBM0 citations52
US6653246B2Nov 25, 2003

High dielectric constant materials

IBM1 citations52

GLOBALFOUNDRIES INC

2 patents

INFINEON TECHNOLOGIES AG

1 patent