Inventor
CHANG JUNG-HAO
TW23 patents
⚠️ This page may combine multiple inventors who share the name “CHANG JUNG-HAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
20 patentsUS11769822B2Sep 26, 2023
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11476365B2Oct 18, 2022
Fin field effect transistor device structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11183580B2Nov 23, 2021
Structure and formation method of semiconductor device with metal gate stack
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11107907B2Aug 31, 2021
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11011413B2May 18, 2021
Interconnect structures and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
US10957779B2Mar 23, 2021
Gate etch back with reduced loading effect
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10157751B1Dec 18, 2018
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US12396205B2Aug 19, 2025
Semiconductor device having fins and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12356646B2Jul 8, 2025
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12198939B2Jan 14, 2025
Technique for semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12154969B2Nov 26, 2024
Semiconductor device structure with metal gate stack
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12087558B2Sep 10, 2024
Ion beam etching apparatus and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12027625B2Jul 2, 2024
Semiconductor device having fins and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11843041B2Dec 12, 2023
Gate etch back with reduced loading effect
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11522065B2Dec 6, 2022
Gate etch back with reduced loading effect
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11515423B2Nov 29, 2022
Semiconductor device having fins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11373878B2Jun 28, 2022
Technique for semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12218219B2Feb 4, 2025
Spacer structure for semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10755943B2Aug 25, 2020
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10680109B2Jun 9, 2020
CMOS semiconductor device having fins and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
UNITED MICROELECTRONICS CORP
3 patentsUS12103845B2Oct 1, 2024
Micro-electromechanical system and method for fabricating MEMS having protection wall
UNITED MICROELECTRONICS CORP2 citations72
US10737932B2Aug 11, 2020
Micro-electro-mechanical system structure and method for fabricating the same
UNITED MICROELECTRONICS CORP2 citations71
US12441606B2Oct 14, 2025
MEMS device including coil structure with corrugated polymer film
UNITED MICROELECTRONICS CORP0 citations62