P

Inventor

NONOGAKI SABURO

JP34 patents
⚠️ This page may combine multiple inventors who share the name “NONOGAKI SABURO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

30 patents
US4396705AAug 2, 1983

Pattern forming method and pattern forming apparatus using exposures in a liquid

HITACHI LTD704 citations98
US5081394AJan 14, 1992

Black matrix color picture tube

HITACHI LTD60 citations96
US4904569AFeb 27, 1990

Method of forming pattern and projection aligner for carrying out the same

HITACHI LTD64 citations96
US4436583AMar 13, 1984

Selective etching method of polyimide type resin film

HITACHI LTD32 citations92
US4273842AJun 16, 1981

Process for forming patternwise coated powder layer

HITACHI LTD36 citations92
US4191571AMar 4, 1980

Method of pattern forming in a photosensitive composition having a reciprocity law failing property

HITACHI LTD30 citations91
US4855200AAug 8, 1989

Fluorescent screens of color picture tubes and manufacturing method therefor

HITACHI LTD7 citations74
US4815821AMar 28, 1989

Face plate for display

HITACHI LTD14 citations74
US4537851AAug 27, 1985

Process of forming powder pattern using positive diazonium salt photoresist

HITACHI LTD13 citations74
US5024920AJun 18, 1991

Process for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymer

HITACHI LTD12 citations73
US4985344AJan 15, 1991

Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer

HITACHI LTD14 citations73
US4465768AAug 14, 1984

Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate

HITACHI LTD15 citations73
US4407916AOct 4, 1983

Process for forming fluorescent screen

HITACHI LTD10 citations73
US4269918AMay 26, 1981

Process for forming patternwise coated powder layer

HITACHI LTD15 citations73
US4086090AApr 25, 1978

Formation of pattern using acrylamide-diacetoneacrylamide copolymer

HITACHI LTD14 citations73
US4469778ASep 4, 1984

Pattern formation method utilizing deep UV radiation and bisazide composition

HITACHI LTD13 citations72
US4276363AJun 30, 1981

Process for forming phosphor screens with treated phosphors

HITACHI LTD9 citations72
US4241162ADec 23, 1980

Light sensitive photoresist materials

HITACHI LTD15 citations72
US4614706ASep 30, 1986

Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching

HITACHI LTD16 citations71
US4247612AJan 27, 1981

Method of forming fluorescent screens of color picture tubes

HITACHI LTD9 citations70
US4101440AJul 18, 1978

Chemically digestive agents

HITACHI LTD7 citations70
US5173382ADec 22, 1992

Photosensitive composition containing water-soluble binder and aromatic diazonium chromate forming fluorescent screens employing same

HITACHI LTD3 citations63
US4857429AAug 15, 1989

Process of improving optical contact of patternwise powdery coating layer and phosphor screen provided therefore

HITACHI LTD2 citations63
US4564572AJan 14, 1986

Process for forming pattern

HITACHI LTD4 citations62
US4510226AApr 9, 1985

Photosensitive composition and pattern forming process using same

HITACHI LTD2 citations62
US4409313AOct 11, 1983

Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine

HITACHI LTD4 citations62
US4377630AMar 22, 1983

Photosensitive composition

HITACHI LTD2 citations62
US4187205AFeb 5, 1980

Radiation-sensitive composition

HITACHI LTD5 citations61
US4735880AApr 5, 1988

Photosensitive composition and pattern forming process using same

HITACHI LTD1 citations52
US4520094AMay 28, 1985

Process for forming powder pattern on light exposed layer having photosensitive diazonium salts

HITACHI LTD1 citations51

HITACHI CHEMICAL CO LTD

2 patents

HITACHI MAXELL

1 patent

NIPPON TELEGRAPH & TELEPHONE

1 patent