Inventor
NONOGAKI SABURO
JP34 patents
⚠️ This page may combine multiple inventors who share the name “NONOGAKI SABURO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
30 patentsUS4396705AAug 2, 1983
Pattern forming method and pattern forming apparatus using exposures in a liquid
HITACHI LTD704 citations98
US5081394AJan 14, 1992
Black matrix color picture tube
HITACHI LTD60 citations96
US4904569AFeb 27, 1990
Method of forming pattern and projection aligner for carrying out the same
HITACHI LTD64 citations96
US4436583AMar 13, 1984
Selective etching method of polyimide type resin film
HITACHI LTD32 citations92
US4273842AJun 16, 1981
Process for forming patternwise coated powder layer
HITACHI LTD36 citations92
US4191571AMar 4, 1980
Method of pattern forming in a photosensitive composition having a reciprocity law failing property
HITACHI LTD30 citations91
US4855200AAug 8, 1989
Fluorescent screens of color picture tubes and manufacturing method therefor
HITACHI LTD7 citations74
US4815821AMar 28, 1989
Face plate for display
HITACHI LTD14 citations74
US4537851AAug 27, 1985
Process of forming powder pattern using positive diazonium salt photoresist
HITACHI LTD13 citations74
US5024920AJun 18, 1991
Process for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymer
HITACHI LTD12 citations73
US4985344AJan 15, 1991
Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer
HITACHI LTD14 citations73
US4465768AAug 14, 1984
Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate
HITACHI LTD15 citations73
US4407916AOct 4, 1983
Process for forming fluorescent screen
HITACHI LTD10 citations73
US4269918AMay 26, 1981
Process for forming patternwise coated powder layer
HITACHI LTD15 citations73
US4086090AApr 25, 1978
Formation of pattern using acrylamide-diacetoneacrylamide copolymer
HITACHI LTD14 citations73
US4469778ASep 4, 1984
Pattern formation method utilizing deep UV radiation and bisazide composition
HITACHI LTD13 citations72
US4276363AJun 30, 1981
Process for forming phosphor screens with treated phosphors
HITACHI LTD9 citations72
US4241162ADec 23, 1980
Light sensitive photoresist materials
HITACHI LTD15 citations72
US4614706ASep 30, 1986
Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching
HITACHI LTD16 citations71
US4247612AJan 27, 1981
Method of forming fluorescent screens of color picture tubes
HITACHI LTD9 citations70
US4101440AJul 18, 1978
Chemically digestive agents
HITACHI LTD7 citations70
US5173382ADec 22, 1992
Photosensitive composition containing water-soluble binder and aromatic diazonium chromate forming fluorescent screens employing same
HITACHI LTD3 citations63
US4857429AAug 15, 1989
Process of improving optical contact of patternwise powdery coating layer and phosphor screen provided therefore
HITACHI LTD2 citations63
US4564572AJan 14, 1986
Process for forming pattern
HITACHI LTD4 citations62
US4510226AApr 9, 1985
Photosensitive composition and pattern forming process using same
HITACHI LTD2 citations62
US4409313AOct 11, 1983
Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine
HITACHI LTD4 citations62
US4377630AMar 22, 1983
Photosensitive composition
HITACHI LTD2 citations62
US4187205AFeb 5, 1980
Radiation-sensitive composition
HITACHI LTD5 citations61
US4735880AApr 5, 1988
Photosensitive composition and pattern forming process using same
HITACHI LTD1 citations52
US4520094AMay 28, 1985
Process for forming powder pattern on light exposed layer having photosensitive diazonium salts
HITACHI LTD1 citations51
HITACHI CHEMICAL CO LTD
2 patentsUS4565768AJan 21, 1986
Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern
HITACHI CHEMICAL CO LTD67 citations96
US4728594AMar 1, 1988
Photosensitive composition with azide or bisazide compound with oxazolone group
HITACHI CHEMICAL CO LTD11 citations73