Inventor

SHAMMA NADER

US25 patents

⚠️ This page may combine multiple inventors who share the name “SHAMMA NADER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHAMMA NADER

LAM RES CORP

PECVD films for EUV lithography

Tin oxide films in semiconductor device manufacturing

Eliminating yield impact of stochastics in lithography

Eliminating yield impact of stochastics in lithography

Tin oxide films in semiconductor device manufacturing

Etching substrates using ale and selective deposition

Method for forming a mask by etching conformal film on patterned ashable hardmask

Tin oxide films in semiconductor device manufacturing

Etching substrates using ALE and selective deposition

Low roughness EUV lithography

PECVD films for EUV lithography

Tin oxide films in semiconductor device manufacturing

Tin oxide films in semiconductor device manufacturing

Low roughness EUV lithography

Image reversal with AHM gap fill for multiple patterning

Integration of dry development and etch processes for EUV patterning in a single process chamber

Eliminating yield impact of stochastics in lithography

Modification of SNO2 surface for EUV lithography

Extreme ultraviolet (EUV) lithography using an intervening layer or a multi-layer stack with varying mean free paths for secondary electron generation

NOVELLUS SYSTEMS INC

Soft landing nanolaminates for advanced patterning

Soft landing nanolaminates for advanced patterning

Soft landing nanolaminates for advanced patterning

HEWLETT PACKARD CO

Method of making a mask for proximity effect correction in projection lithography

Method and apparatus for determining a feature-forming variant of a lithographic system

ASML NETHERLANDS BV

Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program