Inventor
PEREL ALEXANDER S
US28 patents
⚠️ This page may combine multiple inventors who share the name “PEREL ALEXANDER S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AXCELIS TECH INC
9 patentsUS6288403B1Sep 11, 2001
Decaborane ionizer
AXCELIS TECH INC89 citations96
US6479828B2Nov 12, 2002
Method and system for icosaborane implantation
AXCELIS TECH INC34 citations92
US7078712B2Jul 18, 2006
In-situ monitoring on an ion implanter
AXCELIS TECH INC23 citations91
US6958481B2Oct 25, 2005
Decaborane ion source
AXCELIS TECH INC27 citations91
US6992311B1Jan 31, 2006
In-situ cleaning of beam defining apertures in an ion implanter
AXCELIS TECH INC41 citations90
US7435977B2Oct 14, 2008
Ion beam angle measurement systems and methods for ion implantation systems
AXCELIS TECH INC7 citations73
US7598495B2Oct 6, 2009
Methods and systems for trapping ion beam particles and focusing an ion beam
AXCELIS TECH INC2 citations62
US7423277B2Sep 9, 2008
Ion beam monitoring in an ion implanter using an imaging device
AXCELIS TECH INC5 citations56
US7205556B2Apr 17, 2007
Bellows liner for an ion beam implanter
AXCELIS TECH INC1 citations47
VARIAN SEMICONDUCTOR EQUIPMENT
7 patentsUS7586109B2Sep 8, 2009
Technique for improving the performance and extending the lifetime of an ion source with gas dilution
VARIAN SEMICONDUCTOR EQUIPMENT41 citations92
US9142379B2Sep 22, 2015
Ion source and a method for in-situ cleaning thereof
VARIAN SEMICONDUCTOR EQUIPMENT7 citations83
US7459704B2Dec 2, 2008
Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms
VARIAN SEMICONDUCTOR EQUIPMENT17 citations82
US8003959B2Aug 23, 2011
Ion source cleaning end point detection
VARIAN SEMICONDUCTOR EQUIPMENT4 citations62
US7767986B2Aug 3, 2010
Method and apparatus for controlling beam current uniformity in an ion implanter
VARIAN SEMICONDUCTOR EQUIPMENT5 citations62
US7723697B2May 25, 2010
Techniques for optical ion beam metrology
VARIAN SEMICONDUCTOR EQUIPMENT4 citations60
US8003957B2Aug 23, 2011
Ethane implantation with a dilution gas
VARIAN SEMICONDUCTOR EQUIPMENT2 citations58
APPLIED MATERIALS INC
4 patentsUS10896799B1Jan 19, 2021
Ion source with multiple configurations
APPLIED MATERIALS INC3 citations69
US11251010B1Feb 15, 2022
Shaped repeller for an indirectly heated cathode ion source
APPLIED MATERIALS INC4 citations66
US11810746B2Nov 7, 2023
Variable thickness ion source extraction plate
APPLIED MATERIALS INC0 citations62
US10818469B2Oct 27, 2020
Cylindrical shaped arc chamber for indirectly heated cathode ion source
APPLIED MATERIALS INC0 citations52