Inventor

WU TSIAO-CHEN

TW25 patents

⚠️ This page may combine multiple inventors who share the name “WU TSIAO-CHEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WU TSIAO-CHEN

TAIWAN SEMICONDUCTOR MFG CO LTD

Reflective mask and fabricating method thereof

Semiconductor lithography system and/or method

Method for EUV power improvement with fuel droplet trajectory stabilization

Pellicle and method for manufacturing the same

Semiconductor lithography system and/or method

Reflective mask and fabricating method thereof

Semiconductor lithography system and/or method

Reflective mask and fabricating method thereof

Apparatus and method for generating an electromagnetic radiation

Apparatus and method for generating an electromagnetic radiation

Apparatus for shielding reticle

Method and apparatus for ultraviolet (UV) patterning with reduced outgassing

High-brightness light source

Wafer surface conditioning for stability in fab environment

TAIWAN SEMICONDUCTOR MFG

Reflective mask and method of making same

Method of forming a photomask utilizing electron beam dosage compensation method employing dummy pattern

Dual damascene trench formation to avoid low-K dielectric damage

Structure design and fabrication on photomask for contact hole manufacturing process window enhancement

Photoresist having improved extreme-ultraviolet lithography imaging performance

Method for patterning a photosensitive layer

LU HSIAO-TZU

Method for patterning a photosensitive layer

Method for patterning a photosensitive layer

HSU PEI-CHENG

Reflective mask and method of making same

SHIH CHIA-TSUNG

Phase shift mask for extreme ultraviolet lithography and method of fabricating same

CHANG SHU-HAO

Photoresist having improved extreme-ultraviolet lithography imaging performance