Inventor
CHEN LUOQI
US40 patents
⚠️ This page may combine multiple inventors who share the name “CHEN LUOQI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
17 patentsUS9111062B2Aug 18, 2015
Fast freeform source and mask co-optimization method
ASML NETHERLANDS BV22 citations93
US8938694B2Jan 20, 2015
Three-dimensional mask model for photolithography simulation
ASML NETHERLANDS BV22 citations93
US8352885B2Jan 8, 2013
Three-dimensional mask model for photolithography simulation
ASML NETHERLANDS BV21 citations93
US7873937B2Jan 18, 2011
System and method for lithography simulation
ASML NETHERLANDS BV9 citations93
US7747978B2Jun 29, 2010
System and method for creating a focus-exposure model of a lithography process
ASML NETHERLANDS BV37 citations93
US11042687B2Jun 22, 2021
Fast freeform source and mask co-optimization method
ASML NETHERLANDS BV4 citations84
US10839131B2Nov 17, 2020
Three-dimensional mask model for photolithography simulation
ASML NETHERLANDS BV3 citations84
US10198549B2Feb 5, 2019
Three-dimensional mask model for photolithography simulation
ASML NETHERLANDS BV3 citations84
US9372957B2Jun 21, 2016
Three-dimensional mask model for photolithography simulation
ASML NETHERLANDS BV6 citations84
US11461532B2Oct 4, 2022
Three-dimensional mask model for photolithography simulation
ASML NETHERLANDS BV1 citations73
US10592633B2Mar 17, 2020
Fast freeform source and mask co-optimization method
ASML NETHERLANDS BV1 citations73
US9953127B2Apr 24, 2018
Fast freeform source and mask co-optimization method
ASML NETHERLANDS BV2 citations73
US9262579B2Feb 16, 2016
Integration of lithography apparatus and mask optimization process with multiple patterning process
ASML NETHERLANDS BV3 citations73
US8893067B2Nov 18, 2014
System and method for lithography simulation
ASML NETHERLANDS BV2 citations63
US10401732B2Sep 3, 2019
Optimization flows of source, mask and projection optics
ASML NETHERLANDS BV1 citations60
US8942463B2Jan 27, 2015
Harmonic resist model for use in a lithographic apparatus and a device manufacturing method
ASML NETHERLANDS BV0 citations52
US10423745B2Sep 24, 2019
Correction for flare effects in lithography system
ASML NETHERLANDS BV0 citations49
BRION TECH INC
5 patentsUS7120895B2Oct 10, 2006
System and method for lithography simulation
BRION TECH INC73 citations99
US7111277B2Sep 19, 2006
System and method for lithography simulation
BRION TECH INC65 citations99
US7003758B2Feb 21, 2006
System and method for lithography simulation
BRION TECH INC281 citations99
US7114145B2Sep 26, 2006
System and method for lithography simulation
BRION TECH INC63 citations98
US7117478B2Oct 3, 2006
System and method for lithography simulation
BRION TECH INC61 citations96
CHEN LUOQI
4 patentsUS8584056B2Nov 12, 2013
Fast freeform source and mask co-optimization method
CHEN LUOQI42 citations97
US8819601B2Aug 26, 2014
Integration of lithography apparatus and mask optimization process with multiple patterning process
CHEN LUOQI7 citations83
US8572521B2Oct 29, 2013
Method for performing pattern decomposition for a full chip design
CHEN LUOQI18 citations83
US9110382B2Aug 18, 2015
Source polarization optimization
CHEN LUOQI2 citations62
YE JUN
4 patentsUS8065636B2Nov 22, 2011
System and method for creating a focus-exposure model of a lithography process
YE JUN18 citations92
US8245160B2Aug 14, 2012
System and method for creating a focus-exposure model of a lithography process
YE JUN11 citations84
US8209640B2Jun 26, 2012
System and method for lithography simulation
YE JUN3 citations74
US8516405B2Aug 20, 2013
System and method for lithography simulation
YE JUN0 citations52
LIU HUA-YU
3 patentsUS8739082B2May 27, 2014
Method of pattern selection for source and mask optimization
LIU HUA-YU11 citations91
US8543947B2Sep 24, 2013
Selection of optimum patterns in a design layout based on diffraction signature analysis
LIU HUA-YU15 citations91
US8887104B2Nov 11, 2014
Correction for flare effects in lithography system
LIU HUA-YU1 citations49