Inventor
FUKAYA SOUICHI
JP20 patents
⚠️ This page may combine multiple inventors who share the name “FUKAYA SOUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
19 patentsUS10712654B2Jul 14, 2020
Photomask blank
SHINETSU CHEMICAL CO2 citations72
US9268212B2Feb 23, 2016
Photomask blank and method for manufacturing photomask
SHINETSU CHEMICAL CO3 citations72
US9158192B2Oct 13, 2015
Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask
SHINETSU CHEMICAL CO4 citations72
US9440375B2Sep 13, 2016
Blank for mold production and method for manufacturing mold
SHINETSU CHEMICAL CO2 citations62
US9188852B2Nov 17, 2015
Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift mask
SHINETSU CHEMICAL CO3 citations62
US9541823B2Jan 10, 2017
Photomask blank
SHINETSU CHEMICAL CO0 citations52
US9488907B2Nov 8, 2016
Photomask blank, process for production of photomask, and chromium-containing material film
SHINETSU CHEMICAL CO1 citations52
US10747098B2Aug 18, 2020
Halftone phase shift photomask blank
SHINETSU CHEMICAL CO0 citations51
US10120274B2Nov 6, 2018
Method of manufacturing photomask blank and photomask blank
SHINETSU CHEMICAL CO0 citations51
US10040220B2Aug 7, 2018
Blank for mold production and method for manufacturing mold
SHINETSU CHEMICAL CO0 citations51
US9952501B2Apr 24, 2018
Photomask blank, making method, and photomask
SHINETSU CHEMICAL CO1 citations51
US9851633B2Dec 26, 2017
Inorganic material film, photomask blank, and method for manufacturing photomask
SHINETSU CHEMICAL CO0 citations51
US9798229B2Oct 24, 2017
Designing of photomask blank and photomask blank
SHINETSU CHEMICAL CO0 citations51
US9618838B2Apr 11, 2017
Photomask blank
SHINETSU CHEMICAL CO0 citations51
US9581892B2Feb 28, 2017
Method of manufacturing photomask blank and photomask blank
SHINETSU CHEMICAL CO0 citations51
US9063427B2Jun 23, 2015
Photomask blank and manufacturing method thereof
SHINETSU CHEMICAL CO0 citations51
US9689066B2Jun 27, 2017
Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method
SHINETSU CHEMICAL CO0 citations42
US9880459B2Jan 30, 2018
Photomask blank and method for preparing photomask
SHINETSU CHEMICAL CO0 citations41
US9798230B2Oct 24, 2017
Photomask blank
SHINETSU CHEMICAL CO0 citations40