Inventor
LIU WEIHONG
US21 patents
⚠️ This page may combine multiple inventors who share the name “LIU WEIHONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MERCK PATENT GMBH
4 patentsUS11822242B2Nov 21, 2023
DNQ-type photoresist composition including alkali-soluble acrylic resins
MERCK PATENT GMBH0 citations51
US12393115B2Aug 19, 2025
Positive working photosensitive material
MERCK PATENT GMBH0 citations50
US12276909B2Apr 15, 2025
Novolak/DNQ based, chemically amplified photoresist
MERCK PATENT GMBH0 citations49
US11698586B2Jul 11, 2023
Negative-working ultra thick film photoresist
MERCK PATENT GMBH0 citations47
UNIV CALIFORNIA
3 patentsUS11435349B2Sep 6, 2022
CD127 expression inversely correlates with FoxP3 and suppressive function of CD4+ Tregs
UNIV CALIFORNIA1 citations70
US9977021B2May 22, 2018
CD127 expression inversely correlates with FoxP3 and suppressive function of CD4+ tregs
UNIV CALIFORNIA2 citations70
US12436150B2Oct 7, 2025
CD127 expression inversely correlates with FoxP3 and suppressive function of CD4+ Tregs
UNIV CALIFORNIA0 citations60
LIU WEIHONG
3 patentsUS9252893B2Feb 2, 2016
Methods for determining a beam-forming gain parameter, user equipment, base station, computer programs and computer program products
LIU WEIHONG6 citations68
US9012126B2Apr 21, 2015
Positive photosensitive material
LIU WEIHONG5 citations68
US8841062B2Sep 23, 2014
Positive working photosensitive material
LIU WEIHONG6 citations67