Inventor · disambiguated record
Agnès Maitre
Also filed as: MAITRE AGNÈS
2 granted patents·0 citations·filing 2018–2018
22Inventor score
Files withCENTRE NAT RECH SCIENT2
Top patents by PatentIndex Score
2 records- 0138US10775702B2Optical lithography process adapted for a sample comprising at least one fragile light emitterCENTRE NAT RECH SCIENT·Filed 2018·Granted Sep 15, 2020·0 cites·20 claims
- 0233US11127565B2Electron-beam lithography process adapted for a sample comprising at least one fragile nanostructureCENTRE NAT RECH SCIENT·Filed 2018·Granted Sep 21, 2021·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →