Inventor · disambiguated record
Akhiro Hisai
Also filed as: HISAI AKHIRO
0 granted patents·2 pending applications·0 citations·filing 2007–2007
Files withSOKUDO CO LTD2
Top patents by PatentIndex Score
2 records- 0146US2008090185A1Method and apparatus for rinsing a substrate during lithographic development processingSOKUDO CO LTD·Filed 2007·Application pending·0 cites
- 0246US2008090186A1Method and system for performing development processing during photolithographySOKUDO CO LTD·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →