Inventor · disambiguated record
Akira Hisano
Also filed as: HISANO AKIRA
8 granted patents·1 pending application·79 citations·filing 2003–2018
86Inventor score
Top patents by PatentIndex Score
9 records- 0196US7927434B2Co-Cr-Pt-B alloy sputtering targetJX NIPPON MINING & METALS CORP·Filed 2005·Granted Apr 19, 2011·24 cites·13 claims
- 0293US7909949B2Sputtering target with few surface defects, and surface processing method thereofJX NIPPON MINING & METALS CORP·Filed 2005·Granted Mar 22, 2011·31 cites·3 claims
- 0390US8663402B2Sputtering target with few surface defects, and surface processing method thereofNAKAMURA YUICHIRO·Filed 2011·Granted Mar 4, 2014·6 cites·5 claims
- 0485US10066290B1Sintered compact magnesium oxide target for sputtering, and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2018·Granted Sep 4, 2018·2 cites·1 claims
- 0583US9034154B2Sputtering target and process for producing sameNAKAMURA YUICHIRO·Filed 2010·Granted May 19, 2015·3 cites·19 claims
- 0683US7578965B2High-purity Ru powder, sputtering target obtained by sintering the same, thin film obtained by sputtering the target and process for producing high-purity Ru powderNIPPON MINING CO·Filed 2005·Granted Aug 25, 2009·8 cites·14 claims
- 0779US7767139B2AlRu sputtering target and manufacturing method thereofNIPPON MINING CO·Filed 2007·Granted Aug 3, 2010·3 cites·19 claims
- 0877US9988709B2Sintered compact magnesium oxide target for sputtering, and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2012·Granted Jun 5, 2018·2 cites·6 claims
- 0944US2004144204A1Airu spattering target and method for preparation thereofFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →