Inventor · disambiguated record
Akira Miyake
Also filed as: MIYAKE AKIRA
87 granted patents·17 pending applications·1,247 citations·filing 1977–2021
99Inventor score
Top patents by PatentIndex Score
104 records- 0195US5896438AX-ray optical apparatus and device fabrication methodCANON KK·Filed 1997·Granted Apr 20, 1999·134 cites·9 claims
- 0294US7003075B2Optical measuring deviceCANON KK·Filed 2003·Granted Feb 21, 2006·73 cites·14 claims
- 0392US7280184B2Assembly and adjusting method of optical system, exposure apparatus having the optical systemCANON KK·Filed 2005·Granted Oct 9, 2007·15 cites·10 claims
- 0490US7453560B2Method of evaluating optical elementCANON KK·Filed 2004·Granted Nov 18, 2008·37 cites·13 claims
- 0590US6897456B2Differential pumping system and exposure apparatusCANON KK·Filed 2003·Granted May 24, 2005·37 cites·15 claims
- 0688US7091507B2Light generator and exposure apparatusCANON KK·Filed 2005·Granted Aug 15, 2006·25 cites·24 claims
- 0786US6999172B2Optical apparatusCANON KK·Filed 2002·Granted Feb 14, 2006·31 cites·16 claims
- 0885US6867843B2Debris removing system for use in X-ray light sourceCANON KK·Filed 2002·Granted Mar 15, 2005·35 cites·13 claims
- 0984US6825481B2Exposure apparatus, control method thereof, and device manufacturing method using the sameCANON KK·Filed 2003·Granted Nov 30, 2004·22 cites·19 claims
- 1084US6225637B1Electron beam exposure apparatusCANON KK·Filed 1997·Granted May 1, 2001·43 cites·70 claims
- 1183US8921807B2In situ cleaning device for lithographic apparatusTAKASE HIROMITSU·Filed 2012·Granted Dec 30, 2014·9 cites·6 claims
- 1283US7312459B2Apparatus for evaluating EUV light source, and evaluation method using the sameCANON KK·Filed 2005·Granted Dec 25, 2007·12 cites·9 claims
- 1383US6054713AElectron beam exposure apparatusCANON KK·Filed 1998·Granted Apr 25, 2000·41 cites·10 claims
- 1483US4666769AMagnetic discHITACHI MAXELL·Filed 1985·Granted May 19, 1987·42 cites·6 claims
- 1582US8106584B2Light emitting device and illumination apparatusTABUCHI TOMOYA·Filed 2005·Granted Jan 31, 2012·14 cites·11 claims
- 1682US6070640AWalk-through type waterproof screen apparatusOHBAYASHI CORP·Filed 1997·Granted Jun 6, 2000·69 cites·10 claims
- 1779US5079096AMagnetic recording medium comprising a substrate coated with a primer which is a protonic acid doped polyaniline polymerHITACHI MAXELL·Filed 1990·Granted Jan 7, 1992·30 cites·2 claims
- 1878US7084982B2Optical apparatus, measurement method, and semiconductor device manufacturing methodCANON KK·Filed 2003·Granted Aug 1, 2006·14 cites·25 claims
- 1978US5848119AIllumination system and exposure apparatus having the sameCANON KK·Filed 1996·Granted Dec 8, 1998·43 cites·9 claims
- 2078US5503950AReflection type mask and manufacture of microdevices using the sameCANON KK·Filed 1993·Granted Apr 2, 1996·30 cites·18 claims
- 2177US8981323B2Charged particle beam apparatus, and article manufacturing methodCANON KK·Filed 2013·Granted Mar 17, 2015·3 cites·15 claims
- 2277US7083290B2Adjustment method and apparatus of optical system, and exposure apparatusCANON KK·Filed 2003·Granted Aug 1, 2006·21 cites·19 claims
- 2376US8760628B2Filter, exposure apparatus, and method of manufacturing deviceIIZUKA NAOYA·Filed 2011·Granted Jun 24, 2014·3 cites·14 claims
- 2476US7544960B2Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication methodCANON KK·Filed 2005·Granted Jun 9, 2009·6 cites·12 claims
- 2576US7436490B2Exposure apparatus using blaze type diffraction grating to diffract EUV light and device manufacturing method using the exposure apparatusCANON KK·Filed 2005·Granted Oct 14, 2008·4 cites·9 claims
- 2676US6831744B2Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing methodCANON KK·Filed 2003·Granted Dec 14, 2004·14 cites·21 claims
- 2776US6038279AX-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating deviceCANON KK·Filed 1996·Granted Mar 14, 2000·48 cites·45 claims
- 2875US6504896B2X-ray illumination optical system and x-ray reduction exposure apparatusCANON KK·Filed 1997·Granted Jan 7, 2003·26 cites·31 claims
- 2974US7785407B2Evaporated fuel gas adsorbent, evaporated fuel gas trapping apparatus, active carbon and process for producing the sameKURARAY CHEMICAL KK·Filed 2005·Granted Aug 31, 2010·7 cites·17 claims
- 3073US8716672B2Charged particle optical system, drawing apparatus, and method of manufacturing articleCANON KK·Filed 2013·Granted May 6, 2014·2 cites·28 claims
- 3172US7771898B2Multilayer mirror, evaluation method, exposure apparatus, device manufacturing methodCANON KK·Filed 2007·Granted Aug 10, 2010·7 cites·7 claims
- 3271US7349524B2X-ray generator and exposure apparatusCANON KK·Filed 2005·Granted Mar 25, 2008·3 cites·2 claims
- 3371US6891172B2Differential pumping system and exposure apparatusCANON KK·Filed 2003·Granted May 10, 2005·13 cites·22 claims
- 3471US5394451AOptical arrangement for exposure apparatusCANON KK·Filed 1992·Granted Feb 28, 1995·23 cites·10 claims
- 3570US5774313AMagnetic disk which reduces deterioration in regenerated signals due to optical servo groovesHITACHI MAXELL·Filed 1995·Granted Jun 30, 1998·23 cites·16 claims
- 3669US9063277B2Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing methodMASAKI FUMITARO·Filed 2011·Granted Jun 23, 2015·4 cites·13 claims
- 3769US9036789B2X-ray apparatus and its adjusting methodCANON KK·Filed 2013·Granted May 19, 2015·3 cites·7 claims
- 3868US5469489AProduction method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structureCANON KK·Filed 1995·Granted Nov 21, 1995·26 cites·17 claims
- 3965US5825844AOptical arrangement and illumination methodCANON KK·Filed 1996·Granted Oct 20, 1998·22 cites·17 claims
- 4064US8698095B2Charged particle beam drawing apparatus and article manufacturing methodTANAKA ICHIRO·Filed 2012·Granted Apr 15, 2014·1 cites·8 claims
- 4163US5606586AX-ray exposure method and apparatus and device manufacturing methodCANON KK·Filed 1996·Granted Feb 25, 1997·21 cites·11 claims
- 4262US7352842B2X-ray generator and exposure apparatus having the sameCANON KK·Filed 2005·Granted Apr 1, 2008·1 cites·4 claims
- 4362US7311407B2Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unitCANON KK·Filed 2005·Granted Dec 25, 2007·2 cites·4 claims
- 4461US12130008B2Light emission device and illumination apparatusKYOCERA CORP·Filed 2021·Granted Oct 29, 2024·0 cites·12 claims
- 4561US4956220AMagnetic recording mediumHITACHI MAXELL·Filed 1987·Granted Sep 11, 1990·18 cites·8 claims
- 4659US5101420AX-ray mask support and process for preparation thereofCANON KK·Filed 1991·Granted Mar 31, 1992·14 cites·81 claims
- 4758US7276710B2Light source unit and exposure apparatus having the sameCANON KK·Filed 2005·Granted Oct 2, 2007·4 cites·5 claims
- 4858US5444758ABeam position detecting deviceCANON KK·Filed 1994·Granted Aug 22, 1995·17 cites·9 claims
- 4958US4895758AMagnetic recording mediumHITACHI MAXELL·Filed 1985·Granted Jan 23, 1990·16 cites·7 claims
- 5058US4696869AMagnetic recording mediumHITACHI MAXELL·Filed 1986·Granted Sep 29, 1987·10 cites·11 claims
Showing the top 50 of 104 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →