Inventor · disambiguated record
Akira Sekiya
Also filed as: SEKIYA AKIRA
20 granted patents·9 pending applications·107 citations·filing 1987–2011
94Inventor score
Files withAGENCY IND SCIENCE TECHN8NAT INST OF ADVANCED IND SCIEN7ASAHI GLASS CO LTD2JP THE AGENCY OF IND SCIENCE A2QUAN HENG-DAO2
Top patents by PatentIndex Score
29 records- 0171US8513458B2Process for production of carbonyl fluorideQUAN HENG-DAO·Filed 2006·Granted Aug 20, 2013·4 cites·11 claims
- 0262US6211420B1Process for the preparation of fluorinated olefinAGENCY IND SCIENCE TECHN·Filed 1997·Granted Apr 3, 2001·8 cites·15 claims
- 0362US5847243AProcess for producing fluorinated alkene and fluorinated alkaneJP THE AGENCY OF IND SCIENCE A·Filed 1995·Granted Dec 8, 1998·8 cites·24 claims
- 0459US8043438B2Device for cleaning CVD device and method of cleaning CVD deviceNAT INST OF ADVANCED IND SCIEN·Filed 2004·Granted Oct 25, 2011·4 cites·1 claims
- 0556US6514425B1Dry etching gasAGENCY IND SCIENCE TECHN·Filed 1997·Granted Feb 4, 2003·23 cites·2 claims
- 0654US6787053B2Cleaning gases and etching gasesASAHI GLASS CO LTD·Filed 2001·Granted Sep 7, 2004·5 cites·27 claims
- 0752US7332628B2Process for producing carbonyl fluorideNAT INST OF ADVANCED IND SCIEN·Filed 2004·Granted Feb 19, 2008·1 cites·23 claims
- 0851US6403846B1Fluorinated, saturated hydrocarbonsAGENCY IND SCIENCE TECHN·Filed 1998·Granted Jun 11, 2002·14 cites·21 claims
- 0951US2009105510A1Fluorination catalysts, method for their preparation, and method for producing fluorinated compounds using the catalystsNAT INST OF ADVANCED IND SCIEN·Filed 2008·Application pending·0 cites
- 1049US7322368B2Plasma cleaning gas and plasma cleaning methodASAHI GLASS CO LTD·Filed 2002·Granted Jan 29, 2008·3 cites·6 claims
- 1147US7247289B2Porous aluminum fluorideNAT INST OF ADVANCED IND SCIEN·Filed 2003·Granted Jul 24, 2007·0 cites·8 claims
- 1247US5302764AProcess for preparing trifluorohydrocarbon compoundAGENCY IND SCIENCE TECHN·Filed 1991·Granted Apr 12, 1994·3 cites·11 claims
- 1346US2011061587A1Method of producing pretreated metal fluorides and fluoride crystalsISHIZU SUMITO·Filed 2009·Application pending·0 cites
- 1445US2007027348A1Fluorination catalysts, method for their preparation, and method for producing fluorinated compounds using the catalystsNAT INST OF ADVANCED IND SCIEN·Filed 2006·Application pending·0 cites
- 1544US6383403B1Dry etching methodJAPAN AS REPRESENTED BY THE DI·Filed 1997·Granted May 7, 2002·12 cites·13 claims
- 1644US4822860AFluorine-containing polymeric amine-amide compound and a method for the preparation thereofAGENCY IND SCIENCE TECHN·Filed 1987·Granted Apr 18, 1989·5 cites·4 claims
- 1742US7326279B2Method for removing harmful substance in vent gasKANTO DENKA KOGYO KK·Filed 2003·Granted Feb 5, 2008·1 cites·10 claims
- 1842US2005080303A1Porous calcium fluoride, its producing method, catalyst for hydrogenation reaction, and method for producing trihydrofluorocarbonFiled 2003·Application pending·0 cites
- 1941US8277560B2CVD apparatus and method of cleaning the CVD apparatusSAKAI KATSUO·Filed 2003·Granted Oct 2, 2012·2 cites·6 claims
- 2041US2008274334A1Dry Etching Gas and Method of Dry EtchingNAT INST OF ADVANCED IND SCIEN·Filed 2005·Application pending·0 cites
- 2140US6322715B1Gas composition for dry etching and process of dry etchingJP THE AGENCY OF IND SCIENCE A·Filed 1997·Granted Nov 27, 2001·9 cites·10 claims
- 2240US2005252451A1Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gasBEPPU TATSURO·Filed 2003·Application pending·0 cites
- 2339US7138364B2Cleaning gas and etching gasNAT INST OF ADVANCED IND SCIEN·Filed 2003·Granted Nov 21, 2006·0 cites·16 claims
- 2437US5071915AFluorine-containing polymeric compound and a method for the preparation thereofAGENCY IND SCIENCE TECHN·Filed 1990·Granted Dec 10, 1991·3 cites·3 claims
- 2535US5001198AFluorine-containing polymeric compound and a method for the preparation thereofAGENCY IND SCIENCE TECHN·Filed 1989·Granted Mar 19, 1991·2 cites·3 claims
- 2635US2004255854A1Cvd apparatus and method of cleaning the cvd apparatusFiled 2003·Application pending·0 cites
- 2732US2003143846A1Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon- containing compoundsFiled 2001·Application pending·0 cites
- 2829US4997886AFluorine-containing polymeric compound and method for the preparation thereofAGENCY IND SCIENCE TECHN·Filed 1990·Granted Mar 5, 1991·0 cites·3 claims
- 2929US2013158304A1Method for producing a fluorocompoundQUAN HENG-DAO·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →