Inventor · disambiguated record
Akinori Shibuya
Also filed as: SHIBUYA AKINORI
50 granted patents·32 pending applications·145 citations·filing 2002–2023
97Inventor score
Top patents by PatentIndex Score
82 records- 0192US9250519B2Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the methodFUJIFILM CORP·Filed 2014·Granted Feb 2, 2016·8 cites·20 claims
- 0291US9291892B2Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the compositionFUJIFILM CORP·Filed 2014·Granted Mar 22, 2016·7 cites·25 claims
- 0390US9523912B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compoundFUJIFILM CORP·Filed 2015·Granted Dec 20, 2016·7 cites·14 claims
- 0488US8557499B2Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the compositionYAMAGUCHI SHUHEI·Filed 2010·Granted Oct 15, 2013·5 cites·18 claims
- 0586US9551931B2Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2015·Granted Jan 24, 2017·5 cites·11 claims
- 0686US8841060B2Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic deviceKATAOKA SHOHEI·Filed 2012·Granted Sep 23, 2014·12 cites·20 claims
- 0783US9081277B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the compositionMATSUDA TOMOKI·Filed 2011·Granted Jul 14, 2015·6 cites·15 claims
- 0882US8617788B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameKATO TAKAYUKI·Filed 2010·Granted Dec 31, 2013·4 cites·13 claims
- 0982US8541160B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameSHIBUYA AKINORI·Filed 2011·Granted Sep 24, 2013·5 cites·23 claims
- 1082US7955780B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2008·Granted Jun 7, 2011·6 cites·11 claims
- 1181US10450417B2Resin, composition, cured film, method for manufacturing cured film and semiconductor deviceFUJIFILM CORP·Filed 2018·Granted Oct 22, 2019·3 cites·8 claims
- 1280US10538627B2Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor compositionFUJIFILM CORP·Filed 2017·Granted Jan 21, 2020·3 cites·22 claims
- 1379US10526448B2Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor deviceFUJIFILM CORP·Filed 2017·Granted Jan 7, 2020·2 cites·17 claims
- 1478US9034558B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming patternYAMAGUCHI SHUHEI·Filed 2011·Granted May 19, 2015·3 cites·13 claims
- 1576US7794916B2Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive compositionFUJIFILM CORP·Filed 2007·Granted Sep 14, 2010·3 cites·10 claims
- 1676US7648817B2Positive working resist composition and pattern forming methodFUJIFILM CORP·Filed 2008·Granted Jan 19, 2010·4 cites·5 claims
- 1774US9405197B2Pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Aug 2, 2016·2 cites·18 claims
- 1872US6878505B2Photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Apr 12, 2005·11 cites·48 claims
- 1971US8911930B2Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and patternENOMOTO YUICHIRO·Filed 2010·Granted Dec 16, 2014·2 cites·12 claims
- 2070US8460850B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using sameSATO KENICHIRO·Filed 2009·Granted Jun 11, 2013·2 cites·17 claims
- 2169US6946956B2Locating system and method for determining positions of objectsNIPPON TELEGRAPH & TELEPHONE·Filed 2002·Granted Sep 20, 2005·26 cites·32 claims
- 2266US8715903B2Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameTOMEBA HISAMITSU·Filed 2011·Granted May 6, 2014·2 cites·12 claims
- 2362US2023161249A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compoundFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 2460US7169529B2Compound, photosensitive composition, lithographic printing plate precursor, and method of forming imageFUJI PHOTO FILM CO LTD·Filed 2004·Granted Jan 30, 2007·5 cites·9 claims
- 2556US7629107B2Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive compositionFUJIFILM CORP·Filed 2007·Granted Dec 8, 2009·4 cites·9 claims
- 2656US2009325102A1Photosensitive composition and pattern forming method using sameFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 2755US11860538B2Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor deviceFUJIFILM CORP·Filed 2019·Granted Jan 2, 2024·0 cites·20 claims
- 2855US11567405B2Photosensitive resin composition, polymer precursor, cured film, laminate, method for producing cured film, and semiconductor deviceFUJIFILM CORP·Filed 2019·Granted Jan 31, 2023·0 cites·28 claims
- 2953US8846293B2Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same compositionIIZUKA YUSUKE·Filed 2012·Granted Sep 30, 2014·3 cites·13 claims
- 3052US7232644B2Polymerizable composition and negative-working planographic printing plate precursor using the sameFUJIFILM CORP·Filed 2003·Granted Jun 19, 2007·1 cites·18 claims
- 3151US11401361B2Curable composition for imprinting, cured product, pattern forming method, lithography method, pattern, mask for lithography, and polymerizable composition for imprintingFUJIFILM CORP·Filed 2020·Granted Aug 2, 2022·0 cites·19 claims
- 3250US7267925B2Photosensitive composition and novel compound used thereforFUJIFILM CORP·Filed 2004·Granted Sep 11, 2007·2 cites·10 claims
- 3350US2021388134A1Curable composition for imprinting, kit, pattern producing method, and method for manufacturing semiconductor elementFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 3449US11899361B2Kit, composition for forming underlayer film for imprinting, laminate, and production method using the sameFUJIFILM CORP·Filed 2020·Granted Feb 13, 2024·0 cites·19 claims
- 3549US11441053B2Composition for forming adhesive film for imprinting, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrateFUJIFILM CORP·Filed 2019·Granted Sep 13, 2022·0 cites·19 claims
- 3649US9012123B2Positive resist composition and pattern forming method using the sameYAMAMOTO KEI·Filed 2009·Granted Apr 21, 2015·0 cites·35 claims
- 3749US2022009153A1Composition for forming pattern, kit, cured film, laminate, pattern producing method, and method for manufacturing semiconductor elementFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 3848US10649329B2Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted May 12, 2020·0 cites·17 claims
- 3948US9046773B2Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compoundYAMAGUCHI SHUHEI·Filed 2009·Granted Jun 2, 2015·0 cites·18 claims
- 4048US8932794B2Positive photosensitive composition and pattern forming method using the sameFUKUHARA TOSHIAKI·Filed 2009·Granted Jan 13, 2015·0 cites·17 claims
- 4147US11299653B2Composition, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrateFUJIFILM CORP·Filed 2019·Granted Apr 12, 2022·0 cites·16 claims
- 4247US9023579B2Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the compositionYAMAGUCHI SHUHEI·Filed 2012·Granted May 5, 2015·0 cites·22 claims
- 4347US7396634B2Photosensitive compositionFUJIFILM CORP·Filed 2005·Granted Jul 8, 2008·2 cites·11 claims
- 4447US2015093691A1Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 4547US2012219910A1Photosensitive composition and pattern forming method using sameSHIBUYA AKINORI·Filed 2012·Application pending·0 cites
- 4646US9841679B2Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Dec 12, 2017·0 cites·15 claims
- 4746US2014212814A1Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 4846US2010104974A1Positive resist composition and pattern forming methodFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 4946US2015111157A1Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the methodFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 5045US9454079B2Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2014·Granted Sep 27, 2016·0 cites·11 claims
Showing the top 50 of 82 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →