Inventor · disambiguated record
Akira Shimase
Also filed as: SHIMASE AKIRA
51 granted patents·3 pending applications·2,457 citations·filing 1982–2022
99Inventor score
Top patents by PatentIndex Score
54 records- 0197US5055696AMultilayered device micro etching method and systemHITACHI LTD·Filed 1989·Granted Oct 8, 1991·207 cites·19 claims
- 0297US4687939AMethod and apparatus for forming film by ion beamHITACHI LTD·Filed 1984·Granted Aug 18, 1987·83 cites·6 claims
- 0397US4609809AMethod and apparatus for correcting delicate wiring of IC deviceHITACHI LTD·Filed 1984·Granted Sep 2, 1986·99 cites·21 claims
- 0496US6465781B1Method and apparatus for inspecting or measuring a sample based on charged-particle beam imaging, and a charged-particle beam apparatusHITACHI LTD·Filed 2000·Granted Oct 15, 2002·85 cites·25 claims
- 0596US5825035AProcessing method and apparatus using focused ion beam generating meansHITACHI LTD·Filed 1996·Granted Oct 20, 1998·140 cites·16 claims
- 0695US5504340AProcess method and apparatus using focused ion beam generating meansHITACHI LTD·Filed 1994·Granted Apr 2, 1996·94 cites·37 claims
- 0794US4868068AIC wiring connecting method and resulting articleHITACHI LTD·Filed 1987·Granted Sep 19, 1989·59 cites·43 claims
- 0893US6303932B1Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beamHITACHI LTD·Filed 1998·Granted Oct 16, 2001·84 cites·19 claims
- 0993US5583344AProcess method and apparatus using focused ion beam generating meansHITACHI LTD·Filed 1996·Granted Dec 10, 1996·73 cites·6 claims
- 1093US4900695ASemiconductor integrated circuit device and process for producing the sameHITACHI LTD·Filed 1987·Granted Feb 13, 1990·151 cites·31 claims
- 1193US4503329AIon beam processing apparatus and method of correcting mask defectsHITACHI LTD·Filed 1982·Granted Mar 5, 1985·100 cites·12 claims
- 1292US6960765B2Probe driving method, and probe apparatusHITACHI ULSI SYS CO LTD·Filed 2001·Granted Nov 1, 2005·50 cites·7 claims
- 1392US5656811AMethod for making specimen and apparatus thereofHITACHI LTD·Filed 1995·Granted Aug 12, 1997·138 cites·27 claims
- 1491US5683547AProcessing method and apparatus using focused energy beamHITACHI LTD·Filed 1994·Granted Nov 4, 1997·156 cites·5 claims
- 1590US5976328APattern forming method using charged particle beam process and charged particle beam processing systemHITACHI LTD·Filed 1997·Granted Nov 2, 1999·58 cites·7 claims
- 1690US5358806APhase shift mask, method of correcting the same and apparatus for carrying out the methodHITACHI LTD·Filed 1992·Granted Oct 25, 1994·70 cites·25 claims
- 1790US4683378AApparatus for ion beam workHITACHI LTD·Filed 1985·Granted Jul 28, 1987·46 cites·8 claims
- 1889US10923404B2Inspection method, inspection device, and marking forming methodHAMAMATSU PHOTONICS KK·Filed 2020·Granted Feb 16, 2021·2 cites·14 claims
- 1987US10955458B2Semiconductor device inspection apparatus and semiconductor device inspection methodHAMAMATSU PHOTONICS KK·Filed 2017·Granted Mar 23, 2021·3 cites·15 claims
- 2087US6753253B1Method of making wiring and logic corrections on a semiconductor device by use of focused ion beamsHITACHI LTD·Filed 1990·Granted Jun 22, 2004·97 cites·19 claims
- 2187US5223109AIon beam processing method and apparatusHITACHI LTD·Filed 1991·Granted Jun 29, 1993·52 cites·5 claims
- 2287US4566765AApparatus for summing several ring-shape laser beamsHITACHI LTD·Filed 1983·Granted Jan 28, 1986·51 cites·15 claims
- 2386US5086015AMethod of etching a semiconductor device by an ion beamHITACHI LTD·Filed 1989·Granted Feb 4, 1992·75 cites·10 claims
- 2486US4933565AMethod and apparatus for correcting defects of X-ray maskHITACHI LTD·Filed 1988·Granted Jun 12, 1990·43 cites·11 claims
- 2585US7271015B2Manufacturing method of semiconductor integrated circuit device and probe cardRENESAS TECH CORP·Filed 2005·Granted Sep 18, 2007·12 cites·3 claims
- 2685US5952658AMethod and system for judging milling end point for use in charged particle beam milling systemHITACHI LTD·Filed 1997·Granted Sep 14, 1999·47 cites·35 claims
- 2785US4925755AMethod of correcting defect in circuit patternHITACHI LTD·Filed 1988·Granted May 15, 1990·40 cites·6 claims
- 2884US6476387B1Method and apparatus for observing or processing and analyzing using a charged beamHITACHI LTD·Filed 1999·Granted Nov 5, 2002·44 cites·22 claims
- 2984US5342448AApparatus for processing a sample using a charged beam and reactive gasesHITACHI LTD·Filed 1993·Granted Aug 30, 1994·39 cites·14 claims
- 3080US5447614AMethod of processing a sample using a charged beam and reactive gases and system employing the sameHITACHI LTD·Filed 1994·Granted Sep 5, 1995·31 cites·8 claims
- 3179US7301146B2Probe driving method, and probe apparatusHITACHI LTD·Filed 2005·Granted Nov 27, 2007·8 cites·16 claims
- 3278US10586743B2Inspection method, inspection device, and marking forming methodHAMAMATSU PHOTONICS KK·Filed 2017·Granted Mar 10, 2020·1 cites·16 claims
- 3377US5229607ACombination apparatus having a scanning electron microscope thereinHITACHI LTD·Filed 1991·Granted Jul 20, 1993·47 cites·29 claims
- 3473US7865012B2Semiconductor failure analysis apparatus which acquires a failure observed image, failure analysis method, and failure analysis programHAMAMATSU PHOTONICS KK·Filed 2006·Granted Jan 4, 2011·4 cites·18 claims
- 3572US5439763AOptical mask and method of correcting the sameHITACHI LTD·Filed 1993·Granted Aug 8, 1995·24 cites·24 claims
- 3670US5497034AIC wiring connecting method and apparatusHITACHI LTD·Filed 1994·Granted Mar 5, 1996·22 cites·72 claims
- 3769US7805691B2Semiconductor failure analysis apparatus, failure analysis method, and failure analysis programHAMAMATSU PHOTONICS KK·Filed 2006·Granted Sep 28, 2010·6 cites·20 claims
- 3868US5472507AIC wiring connecting method and apparatusHITACHI LTD·Filed 1994·Granted Dec 5, 1995·19 cites·44 claims
- 3968US5026664AMethod of providing a semiconductor IC device with an additional conduction pathHITACHI LTD·Filed 1989·Granted Jun 25, 1991·35 cites·26 claims
- 4067US6507029B1Sample processing apparatus and method for removing charge on sample through light irradiationHITACHI LTD·Filed 1999·Granted Jan 14, 2003·20 cites·9 claims
- 4166US4479060AApparatus for irradiation with charged particle beamsHITACHI LTD·Filed 1982·Granted Oct 23, 1984·11 cites·2 claims
- 4263US4567398ALiquid metal ion sourceHITACHI LTD·Filed 1983·Granted Jan 28, 1986·10 cites·2 claims
- 4358US11181361B2Optical measurement method, optical measurement device, optical measurement program, and recording medium for recording optical measurement programHAMAMATSU PHOTONICS KK·Filed 2018·Granted Nov 23, 2021·0 cites·15 claims
- 4457US2024402092A1Autofocus assistance method, autofocus assistance device, and autofocus assistance programHAMAMATSU PHOTONICS KK·Filed 2022·Application pending·0 cites
- 4552US7517707B2Manufacturing method of semiconductor integrated circuit device and probe cardRENESAS TECH CORP·Filed 2007·Granted Apr 14, 2009·1 cites·7 claims
- 4652US6344115B1Pattern forming method using charged particle beam process and charged particle beam processing systemHITACHI LTD·Filed 1999·Granted Feb 5, 2002·8 cites·4 claims
- 4751US5824598AIC wiring connecting method using focused energy beamsHITACHI LTD·Filed 1995·Granted Oct 20, 1998·9 cites·16 claims
- 4849US12340504B2Semiconductor inspecting method and semiconductor inspecting deviceHAMAMATSU PHOTONICS KK·Filed 2021·Granted Jun 24, 2025·0 cites·22 claims
- 4948US12222387B2Semiconductor device inspection method and semiconductor device inspection apparatusHAMAMATSU PHOTONICS KK·Filed 2021·Granted Feb 11, 2025·0 cites·14 claims
- 5047US12347718B2Wafer conveyance unit and wafer conveyance methodHAMAMATSU PHOTONICS KK·Filed 2020·Granted Jul 1, 2025·0 cites·6 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →