Inventor · disambiguated record
Akinobu Tanaka
Also filed as: TANAKA AKINOBU
40 granted patents·4 pending applications·678 citations·filing 1979–2022
98Inventor score
Files withSHINETSU CHEMICAL CO16NIPPON TELEGRAPH & TELEPHONE6TANAKA AKINOBU6MASUNAGA KEIICHI5WATANABE SATOSHI3
Top patents by PatentIndex Score
44 records- 0196US9075306B2Chemically amplified negative resist composition and patterning processTAKEDA TAKANOBU·Filed 2011·Granted Jul 7, 2015·22 cites·8 claims
- 0296US8470511B2Chemically amplified negative resist composition for EB or EUV lithography and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Jun 25, 2013·16 cites·17 claims
- 0396US8361693B2Chemically amplified positive photoresist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·32 cites·10 claims
- 0495US8426108B2Chemically amplified positive resist composition for EB or EUV lithography and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Apr 23, 2013·13 cites·5 claims
- 0594US8288076B2Chemically amplified resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2010·Granted Oct 16, 2012·12 cites·15 claims
- 0693US8168367B2Resist composition and patterning processWATANABE SATOSHI·Filed 2009·Granted May 1, 2012·13 cites·6 claims
- 0792US8470512B2Polymer, chemically amplified negative resist composition, and patterning processMASUNAGA KEIICHI·Filed 2011·Granted Jun 25, 2013·10 cites·10 claims
- 0888US5612170APositive resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted Mar 18, 1997·72 cites·23 claims
- 0985US5880169ASulfonium salts and chemically amplified positive resist compositionsSHINETSU CHEMICAL CO·Filed 1996·Granted Mar 9, 1999·59 cites·16 claims
- 1084US5457003ANegative working resist material, method for the production of the same and process of forming resist patterns using the sameNIPPON TELEGRAPH & TELEPHONE·Filed 1993·Granted Oct 10, 1995·59 cites·31 claims
- 1183US8361692B2Negative resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·4 cites·18 claims
- 1281US4702990APhotosensitive resin composition and process for forming photo-resist pattern using the sameNIPPON TELEGRAPH & TELEPHONE·Filed 1985·Granted Oct 27, 1987·32 cites·5 claims
- 1380US4507384APattern forming material and method for forming pattern therewithNIPPON TELEGRAPH & TELEPHONE·Filed 1984·Granted Mar 26, 1985·27 cites·6 claims
- 1478US8110335B2Resist patterning process and manufacturing photo maskTAKEDA TAKANOBU·Filed 2009·Granted Feb 7, 2012·6 cites·9 claims
- 1577US8592133B2Resist composition and patterning processWATANABE SATOSHI·Filed 2012·Granted Nov 26, 2013·6 cites·30 claims
- 1677US6841334B2Onium salts and positive resist materials using the sameSHINETSU CHEMICAL CO·Filed 2003·Granted Jan 11, 2005·6 cites·11 claims
- 1775US4564579APattern forming material of a siloxane polymerNIPPON TELEGRAPH & TELEPHONE·Filed 1984·Granted Jan 14, 1986·19 cites·6 claims
- 1873US5158854APhotosensitive and high energy beam sensitive resin composition containing substituted polysiloxaneNIPPON TELEGRAPH & TELEPHONE·Filed 1990·Granted Oct 27, 1992·31 cites·5 claims
- 1972US8252518B2Chemically amplified positive resist composition and resist patterning processTANAKA AKINOBU·Filed 2009·Granted Aug 28, 2012·3 cites·3 claims
- 2071US8389201B2Positive resist composition and pattern forming processTANAKA AKINOBU·Filed 2010·Granted Mar 5, 2013·2 cites·10 claims
- 2170US8603724B2Negative resist composition and patterning processTANAKA AKINOBU·Filed 2010·Granted Dec 10, 2013·2 cites·18 claims
- 2270US5624787AChemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted Apr 29, 1997·31 cites·22 claims
- 2370US5389492AResist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compoundFUJI PHOTO FILM CO LTD·Filed 1994·Granted Feb 14, 1995·32 cites·2 claims
- 2469US2024400406A1Manganese oxide, manganese oxide particles, near-infrared transmission material, and near-infrared transmission filmMITSUI MINING & SMELTING CO LTD·Filed 2022·Application pending·0 cites
- 2568US5290899APhotosensitive material having a silicon-containing polymerTOSOH CORP·Filed 1992·Granted Mar 1, 1994·16 cites·1 claims
- 2668US4238385ACoating composition for forming insulating film on electroconductive substrate for printed circuits and method thereforNIPPON TELEGRAPH & TELEPHONE·Filed 1979·Granted Dec 9, 1980·27 cites·1 claims
- 2767US5856561ABisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositionsSHINETSU CHEMICAL CO·Filed 1996·Granted Jan 5, 1999·11 cites·14 claims
- 2866US8828645B2Negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 9, 2014·1 cites·14 claims
- 2965US5057396APhotosensitive material having a silicon-containing polymerTOSOH CORP·Filed 1989·Granted Oct 15, 1991·14 cites·5 claims
- 3063US8557509B2Negative resist composition, patterning process, and testing process and preparation process of negative resist compositionTANAKA AKINOBU·Filed 2010·Granted Oct 15, 2013·1 cites·11 claims
- 3163US5679496AChemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted Oct 21, 1997·28 cites·16 claims
- 3262US5824824ASulfonium salts and chemically amplified positive resist compositionsSHINETSU CHEMICAL CO·Filed 1996·Granted Oct 20, 1998·31 cites·9 claims
- 3356US5629134AChemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted May 13, 1997·16 cites·19 claims
- 3454US2008241751A1Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Application pending·0 cites
- 3548US2009214960A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2009·Application pending·0 cites
- 3647US5512417APositive resist composition comprising a bis (t-butoxycarbonylmethly(thymolphthalein as a dissolution inhibitorSHINETSU CHEMICAL CO·Filed 1995·Granted Apr 30, 1996·14 cites·8 claims
- 3747US5356753APositive resist materialSHINETSU CHEMICAL CO·Filed 1992·Granted Oct 18, 1994·8 cites·5 claims
- 3846US6667415B1Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the sameSHINETSU CHEMICAL CO·Filed 1994·Granted Dec 23, 2003·2 cites·16 claims
- 3943US8586282B2Resist composition and patterning processWATANABE SATOSHI·Filed 2012·Granted Nov 19, 2013·0 cites·18 claims
- 4039US8546060B2Chemically amplified positive resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2011·Granted Oct 1, 2013·0 cites·5 claims
- 4138US8597868B2Negative resist composition and patterning processDOMON DAISUKE·Filed 2010·Granted Dec 3, 2013·0 cites·11 claims
- 4238US8470509B2Negative resist composition and patterning processTANAKA AKINOBU·Filed 2010·Granted Jun 25, 2013·0 cites·20 claims
- 4337US8394577B2Patterning processTANAKA AKINOBU·Filed 2010·Granted Mar 12, 2013·0 cites·11 claims
- 4430US2003096189A1Onium salts and positive resist materials using the sameFiled 1997·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →