Inventor · disambiguated record
Akira Uehara
Also filed as: NAKANE HISASHI · UEHARA AKIRA
35 granted patents·3 pending applications·1,391 citations·filing 1978–2024
98Inventor score
Files withTOKYO OHKA KOGYO CO LTD21UEHARA AKIRA5TOKYO DENSHI KAGAKU KK4YOKOGAWA ELECTRIC CORP3SONY GROUP CORP2
Top patents by PatentIndex Score
38 records- 0197US4245154AApparatus for treatment with gas plasmaTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Jan 13, 1981·93 cites·9 claims
- 0296US5131524AConveyor system with movable partitionsUEHARA AKIRA·Filed 1991·Granted Jul 21, 1992·84 cites·15 claims
- 0394US4318767AApparatus for the treatment of semiconductor wafers by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1980·Granted Mar 9, 1982·112 cites·7 claims
- 0493US5022979AElectrode for use in the treatment of an object in a plasmaTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jun 11, 1991·58 cites·7 claims
- 0593US5006220AElectrode for use in the treatment of an object in a plasmaTOKYO OHKA KOGYO CO LTD·Filed 1990·Granted Apr 9, 1991·89 cites·2 claims
- 0692US5584647AObject handling devicesTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Dec 17, 1996·146 cites·4 claims
- 0792US4208159AApparatus for the treatment of a wafer by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Jun 17, 1980·70 cites·3 claims
- 0890US4790262AThin-film coating apparatusTOKYO DENSHI KAGAKU KK·Filed 1986·Granted Dec 13, 1988·106 cites·5 claims
- 0987US5083896AObject handling deviceTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Jan 28, 1992·76 cites·8 claims
- 1087US4483651AAutomatic apparatus for continuous treatment of leaf materials with gas plasmaTOKYO OHKA KOGYO CO LTD·Filed 1981·Granted Nov 20, 1984·58 cites·6 claims
- 1185US5364488ACoaxial plasma processing apparatusTOKYO OHKA KOGYO CO LTD·Filed 1992·Granted Nov 15, 1994·47 cites·16 claims
- 1284US9807896B2ConverterYOKOGAWA ELECTRIC CORP·Filed 2015·Granted Oct 31, 2017·4 cites·4 claims
- 1384US4578559APlasma etching methodTOKYO OHKA KOGYO CO LTD·Filed 1984·Granted Mar 25, 1986·23 cites·10 claims
- 1483US4550239AAutomatic plasma processing device and heat treatment deviceTOKYO DENSHI KAGAKU KABUSHIKI·Filed 1982·Granted Oct 29, 1985·57 cites·17 claims
- 1582US5137144AConveyor systemUEHARA AKIRA·Filed 1990·Granted Aug 11, 1992·39 cites·26 claims
- 1678US4336438AApparatus for automatic semi-batch sheet treatment of semiconductor wafers by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1980·Granted Jun 22, 1982·46 cites·7 claims
- 1774US4749436AEquipment for thermal stabilization process of photoresist pattern on semiconductor waferTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Jun 7, 1988·23 cites·6 claims
- 1873US4149923AApparatus for the treatment of wafer materials by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Apr 17, 1979·28 cites·6 claims
- 1972US4550242AAutomatic plasma processing device and heat treatment device for batch treatment of workpiecesTOKYO DENSHI KAGAKU KABUSHIKI·Filed 1982·Granted Oct 29, 1985·36 cites·22 claims
- 2070USD333544SConveyor beltUEHARA AKIRA·Filed 1991·Granted Feb 23, 1993·14 cites·1 claims
- 2169US4577165AHigh-frequency oscillator with power amplifier and automatic power controlTOKYO DENSHI KAGAKU KK·Filed 1984·Granted Mar 18, 1986·23 cites·7 claims
- 2268USD291413SWafer holding frameTOKYO DENSHI KAGAKU KK·Filed 1985·Granted Aug 18, 1987·11 cites·1 claims
- 2366US4894254AMethod of forming silicone filmTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jan 16, 1990·30 cites·22 claims
- 2465US2025137824A1Electromagnetic flow meterYOKOGAWA ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 2563US4868096ASurface treatment of silicone-based coating filmsTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Sep 19, 1989·16 cites·10 claims
- 2662US4880318ASlidable vibration-isolating rubber memberTOKAI RUBBER IND LTD·Filed 1988·Granted Nov 14, 1989·26 cites·15 claims
- 2759US4946537APlasma reactorTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Aug 7, 1990·9 cites·9 claims
- 2857US11867543B2Field device case and field deviceYOKOGAWA ELECTRIC CORP·Filed 2021·Granted Jan 9, 2024·0 cites·19 claims
- 2956US5344536AMethod of and apparatus for processing a workpiece in plasmaTOKYO OHKA KOGYO CO LTD·Filed 1992·Granted Sep 6, 1994·18 cites·20 claims
- 3054US2025209114A1Information processing device and information processing methodSONY GROUP CORP·Filed 2023·Application pending·0 cites
- 3150US2024412331A1Information processing device, information processing method, and programSONY GROUP CORP·Filed 2022·Application pending·0 cites
- 3247US6761930B2Method of coating solution on substrate surface using a slit nozzleTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 13, 2004·1 cites·16 claims
- 3345US6436472B1Method of applying a coating solution to a substrate surface using a rotary coaterTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Aug 20, 2002·10 cites·17 claims
- 3442US6067930ACoaxial plasma processing apparatusTOKYO OHKA KOGYO CO LTD·Filed 1992·Granted May 30, 2000·13 cites·18 claims
- 3540US4911630ADevice for preventing scattering of ejected, molded articles for use in resin molding machineUEHARA AKIRA·Filed 1988·Granted Mar 27, 1990·8 cites·22 claims
- 3635US5709519APlasma processing apparatusTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Jan 20, 1998·9 cites·23 claims
- 3735US4828477ADevice for preventing scattering of molded articles ejected from resin molding machineUEHARA AKIRA·Filed 1987·Granted May 9, 1989·5 cites·12 claims
- 3832US4465553AMethod for dry etching of a substrate surfaceTOKYO DENSHI KAGAKU KK·Filed 1983·Granted Aug 14, 1984·3 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →