Inventor · disambiguated record
Alexander Leybovich
Also filed as: LEYBOVICH ALEXANDER
7 granted patents·5 pending applications·86 citations·filing 1999–2016
83Inventor score
Top patents by PatentIndex Score
12 records- 0174US6739196B2Cleanliness evaluation in sputter targets using phaseTOSOH SMD INC·Filed 2001·Granted May 25, 2004·15 cites·13 claims
- 0266US7712514B2Sputter targets and methods of manufacturing same to reduce particulate emission during sputteringTOSOH SMD INC·Filed 2008·Granted May 11, 2010·0 cites·5 claims
- 0361US6487910B1Method and apparatus for quantitative sputter target cleanliness and characterizationTOSOH SMD INC·Filed 1999·Granted Dec 3, 2002·25 cites·25 claims
- 0458US7087142B2Method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering targetTOSOH SMD INC·Filed 2002·Granted Aug 8, 2006·3 cites·22 claims
- 0556US6494098B1Method of ultrasonic on-line texture characterizationTOSOH SMD INC·Filed 1999·Granted Dec 17, 2002·39 cites·6 claims
- 0655US2005155456A1Sputter targets and methods of manufacturing same to reduce particulate emission during sputteringTOSOH SMD INC·Filed 2005·Application pending·0 cites
- 0750US6895342B2Method and apparatus for non-destructive target cleanliness characterization by types of flaws sorted by size and locationTOSOH SMD INC·Filed 2002·Granted May 17, 2005·1 cites·15 claims
- 0846US2002184970A1Sptutter targets and methods of manufacturing same to reduce particulate emission during sputteringFiled 2001·Application pending·0 cites
- 0943US7334479B2Systems and methods for non-contact measuring sputtering target thickness ultrasonicsTOSOH SMD INC·Filed 2004·Granted Feb 26, 2008·3 cites·20 claims
- 1040US2007158178A1Method and apparatus for deposition of low-k dielectric materialsTOSOH SMD INC·Filed 2003·Application pending·0 cites
- 1132US2018044778A1Sputtering target having reverse bowng target geometryTOSOH SMD INC·Filed 2016·Application pending·0 cites
- 1232US2012305393A1Sputter targetIVANOV EUGENE Y·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →