Inventor · disambiguated record
Annette M. Crevasse
Also filed as: CREVASSE ANNETTE M · CREVASSE ANNETTE MARGARET
30 granted patents·3 pending applications·782 citations·filing 1997–2023
97Inventor score
Files withLUCENT TECHNOLOGIES INC14AGERE SYSTEMS INC11AGERE SYST GUARDIAN CORP4ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC2
Top patents by PatentIndex Score
33 records- 0197US6354928B1Polishing apparatus with carrier ring and carrier head employing like polaritiesAGERE SYST GUARDIAN CORP·Filed 2000·Granted Mar 12, 2002·87 cites·28 claims
- 0295US6033293AApparatus for performing chemical-mechanical polishingLUCENT TECHNOLOGIES INC·Filed 1997·Granted Mar 7, 2000·140 cites·10 claims
- 0388US6059638AMagnetic force carrier and ring for a polishing apparatusLUCENT TECHNOLOGIES INC·Filed 1999·Granted May 9, 2000·82 cites·20 claims
- 0485US6558238B1Apparatus and method for reclamation of used polishing slurryAGERE SYSTEMS INC·Filed 2000·Granted May 6, 2003·27 cites·7 claims
- 0585US6206976B1Deposition apparatus and related method with controllable edge exclusionLUCENT TECHNOLOGIES INC·Filed 1999·Granted Mar 27, 2001·92 cites·36 claims
- 0681US6423149B1Apparatus and method for gradient cleaning of semiconductor wafersAGERE SYST GUARDIAN CORP·Filed 2000·Granted Jul 23, 2002·25 cites·6 claims
- 0781US6261958B1Method for performing chemical-mechanical polishingLUCENT TECHNOLOGIES INC·Filed 1999·Granted Jul 17, 2001·44 cites·13 claims
- 0880US6551410B2Method of cleaning a semiconductor wafer with a cleaning brush assembly having a contractible and expandable arborAGERE SYSTEMS INC·Filed 2000·Granted Apr 22, 2003·16 cites·12 claims
- 0975US6726537B1Polishing carrier headAGERE SYSTEMS INC·Filed 2000·Granted Apr 27, 2004·16 cites·4 claims
- 1074US6579797B1Cleaning brush conditioning apparatusAGERE SYSTEMS INC·Filed 2000·Granted Jun 17, 2003·16 cites·9 claims
- 1174US6514123B1Semiconductor polishing pad alignment device for a polishing apparatus and method of useAGERE SYSTEMS INC·Filed 2000·Granted Feb 4, 2003·29 cites·13 claims
- 1273US6290883B1Method for making porous CMP articleLUCENT TECHNOLOGIES INC·Filed 1999·Granted Sep 18, 2001·43 cites·11 claims
- 1370US6615433B2Apparatus for detecting wetness of a semiconductor wafer cleaning brushAGERE SYSTEMS INC·Filed 2001·Granted Sep 9, 2003·8 cites·7 claims
- 1469US6517416B1Chemical mechanical polisher including a pad conditioner and a method of manufacturing an integrated circuit using the chemical mechanical polisherAGERE SYSTEMS INC·Filed 2000·Granted Feb 11, 2003·12 cites·20 claims
- 1566US6264536B1Reducing polish platen corrosion during integrated circuit fabricationLUCENT TECHNOLOGIES INC·Filed 2000·Granted Jul 24, 2001·10 cites·23 claims
- 1665US2024181596A1Micro-layer cmp polishing subpadROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2023·Application pending·0 cites
- 1763US6750145B2Method of eliminating agglomerate particles in a polishing slurryAGERE SYSTEMS INC·Filed 2001·Granted Jun 15, 2004·6 cites·4 claims
- 1863US6402599B1Slurry recirculation system for reduced slurry dryingAGERE SYST GUARDIAN CORP·Filed 2000·Granted Jun 11, 2002·10 cites·29 claims
- 1962US6121142AMagnetic frictionless gimbal for a polishing apparatusLUCENT TECHNOLOGIES INC·Filed 1998·Granted Sep 19, 2000·22 cites·4 claims
- 2060US6508363B1Slurry containerLUCENT TECHNOLOGIES INC·Filed 2000·Granted Jan 21, 2003·5 cites·10 claims
- 2159US6097484ALocation of defects using dye penetrationLUCENT TECHNOLOGIES INC·Filed 1999·Granted Aug 1, 2000·20 cites·14 claims
- 2259US5967885AMethod of manufacturing an integrated circuit using chemical mechanical polishingLUCENT TECHNOLOGIES INC·Filed 1997·Granted Oct 19, 1999·20 cites·8 claims
- 2353US6287173B1Longer lifetime warm-up wafers for polishing systemsLUCENT TECHNOLOGIES INC·Filed 2000·Granted Sep 11, 2001·5 cites·21 claims
- 2451US6730603B2System and method of determining a polishing endpoint by monitoring signal intensityAGERE SYSTEMS INC·Filed 2001·Granted May 4, 2004·3 cites·14 claims
- 2548US6462305B1Method of manufacturing a polishing pad using a beamAGERE SYSTEMS INC·Filed 2001·Granted Oct 8, 2002·2 cites·23 claims
- 2647US12064846B2Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewithROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Aug 20, 2024·0 cites·10 claims
- 2745US6518987B1Mouse and mouse template for a motion impaired userAGERE SYSTEMS INC·Filed 1999·Granted Feb 11, 2003·17 cites·18 claims
- 2845US6355184B1Method of eliminating agglomerate particles in a polishing slurryAGERE SYST GUARDIAN CORP·Filed 1999·Granted Mar 12, 2002·8 cites·4 claims
- 2943US6183652B1Method for removing microorganism contamination from a polishing slurryLUCENT TECHNOLOGIES INC·Filed 1999·Granted Feb 6, 2001·10 cites·19 claims
- 3036US2002151260A1Carrier head for a chemical mechanical polishing apparatusFiled 2001·Application pending·0 cites
- 3135US2002090889A1Apparatus and method of determining an endpoint during a chemical-mechanical polishing processFiled 2001·Application pending·0 cites
- 3233US6080671AProcess of chemical-mechanical polishing and manufacturing an integrated circuitLUCENT TECHNOLOGIES INC·Filed 1998·Granted Jun 27, 2000·4 cites·9 claims
- 3332US5951382AChemical mechanical polishing carrier fixture and systemLUCENT TECHNOLOGIES INC·Filed 1997·Granted Sep 14, 1999·3 cites·12 claims
Join the waitlist — get patent alerts
Get an alert when Annette M. Crevasse files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →