Inventor · disambiguated record
Andreas Frommhold
Also filed as: FROMMHOLD ANDREAS
11 granted patents·3 pending applications·23 citations·filing 2013–2021
85Inventor score
Files withROBINSON ALEX PHILIP GRAHAM6ROBINSON ALEX PHILLIP GRAHAM4ROBINSON ALEX P G2IRRESISTIBLE MAT LTD1UNIV BIRMINGHAM1
Top patents by PatentIndex Score
14 records- 0187US9519215B2Composition of matter and molecular resist made therefromROBINSON ALEX PHILLIP GRAHAM·Filed 2015·Granted Dec 13, 2016·7 cites·20 claims
- 0282US9229322B2Composition of matter and molecular resist made therefromROBINSON ALEX PHILLIP GRAHAM·Filed 2014·Granted Jan 5, 2016·4 cites·20 claims
- 0380US9122156B2Composition of matter and molecular resist made therefromROBINSON ALEX PHILIP GRAHAM·Filed 2014·Granted Sep 1, 2015·3 cites·21 claims
- 0475US9256126B2MethanofullerenesROBINSON ALEX PHILIP GRAHAM·Filed 2013·Granted Feb 9, 2016·2 cites·20 claims
- 0573US10095112B2Multiple trigger photoresist compositions and methodsROBINSON ALEX PHILLIP GRAHAM·Filed 2017·Granted Oct 9, 2018·2 cites·18 claims
- 0673US9383646B2Two-step photoresist compositions and methodsROBINSON ALEX PHILIP GRAHAM·Filed 2014·Granted Jul 5, 2016·2 cites·14 claims
- 0764US9632409B2FullerenesROBINSON ALEX PHILLIP GRAHAM·Filed 2014·Granted Apr 25, 2017·1 cites·19 claims
- 0857US9323149B2MethanofullerenesROBINSON ALEX PHILIP GRAHAM·Filed 2014·Granted Apr 26, 2016·2 cites·15 claims
- 0947US2023273520A1Sensitivity Enhanced PhotoresistsROBINSON ALEX P G·Filed 2021·Application pending·0 cites
- 1041US10438808B2Hard-mask compositionROBINSON ALEX PHILIP GRAHAM·Filed 2016·Granted Oct 8, 2019·0 cites·8 claims
- 1140US11474430B2Multiple trigger monomer containing photoresist compositions and methodROBINSON ALEX PHILIP GRAHAM·Filed 2017·Granted Oct 18, 2022·0 cites·13 claims
- 1239US2015010703A1Spin on Hard-Mask MaterialUNIV BIRMINGHAM·Filed 2013·Application pending·0 cites
- 1332US2018373143A1Sensitivity enhanced photoresistsIRRESISTIBLE MAT LTD·Filed 2016·Application pending·0 cites
- 1430US11681227B2Enhanced EUV photoresist materials, formulations and processesROBINSON ALEX P G·Filed 2019·Granted Jun 20, 2023·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →