Inventor · disambiguated record
Andreas A. Melas
Also filed as: MELAS ANDREAS A
9 granted patents·1 pending application·196 citations·filing 1982–2007
90Inventor score
Top patents by PatentIndex Score
10 records- 0190US4506815ABubbler cylinder and dip tube deviceTHIOKOL CORP·Filed 1982·Granted Mar 26, 1985·48 cites·9 claims
- 0282US4720560AHybrid organometallic compounds, particularly for metal organic chemical vapor depositionTHIOKOL MORTON INC·Filed 1984·Granted Jan 19, 1988·16 cites·19 claims
- 0381US4792467AMethod for vapor phase deposition of gallium nitride filmTHIOKOL MORTON INC·Filed 1987·Granted Dec 20, 1988·45 cites·9 claims
- 0474US4741894AMethod of producing halide-free metal and hydroxidesTHIOKOL MORTON INC·Filed 1986·Granted May 3, 1988·22 cites·12 claims
- 0570US4734514AHydrocarbon-substituted analogs of phosphine and arsine, particularly for metal organic chemical vapor depositionTHIOKOL MORTON INC·Filed 1986·Granted Mar 29, 1988·33 cites·43 claims
- 0665US4740606AGallium hydride/trialkylamine adducts, and their use in deposition of III-V compound filmsTHIOKOL MORTON INC·Filed 1986·Granted Apr 26, 1988·8 cites·2 claims
- 0755US7341628B2Method to reduce crystal defects particularly in group III-nitride layers and substratesMELAS ANDREAS A·Filed 2004·Granted Mar 11, 2008·6 cites·14 claims
- 0853US5147688AMOCVD of indium oxide and indium/tin oxide films on substratesCVD INC·Filed 1991·Granted Sep 15, 1992·16 cites·14 claims
- 0946US2008087984A1Compound semiconductor modified surface by use of pulsed electron beam and ion implantation through a deposited metal layerMELAS ANDREAS A·Filed 2007·Application pending·0 cites
- 1027US5120676AUse of phosphine and arsine compounds in chemical vapor deposition and chemical dopingCVD INC·Filed 1990·Granted Jun 9, 1992·2 cites·7 claims
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