Inventor · disambiguated record
Ananth Naman
Also filed as: NAMAN ANANTH
8 granted patents·5 pending applications·120 citations·filing 2002–2007
87Inventor score
Top patents by PatentIndex Score
13 records- 0182US7153783B2Materials with enhanced properties for shallow trench isolation/premetal dielectric applicationsHONEYWELL INT INC·Filed 2004·Granted Dec 26, 2006·34 cites·35 claims
- 0282US7141188B2Organic compositionsHONEYWELL INT INC·Filed 2002·Granted Nov 28, 2006·30 cites·49 claims
- 0373US7709371B2Repairing damage to low-k dielectric materials using silylating agentsHONEYWELL INT INC·Filed 2004·Granted May 4, 2010·17 cites·29 claims
- 0471US6998178B2Organic compositionsHONEYWELL INT INC·Filed 2003·Granted Feb 14, 2006·14 cites·54 claims
- 0567US7060204B2Organic compositionsHONEYWELL INT INC·Filed 2003·Granted Jun 13, 2006·13 cites·26 claims
- 0658US7915181B2Repair and restoration of damaged dielectric materials and filmsHONEYWELL INT INC·Filed 2004·Granted Mar 29, 2011·7 cites·26 claims
- 0753US7049005B2Organic compositionsHONEYWELL INT INC·Filed 2002·Granted May 23, 2006·4 cites·42 claims
- 0845US2009026924A1Methods of making low-refractive index and/or low-k organosilicate coatingsLEUNG ROGER Y·Filed 2007·Application pending·0 cites
- 0940US8475666B2Method for making toughening agent materialsRAMOS TERESA A·Filed 2004·Granted Jul 2, 2013·1 cites·26 claims
- 1038US2005239264A1Materials suitable for shallow trench isolationHONEYWELL INT INC·Filed 2004·Application pending·0 cites
- 1136US2004137153A1Layered stacks and methods of production thereofFiled 2002·Application pending·0 cites
- 1235US2004084774A1Gas layer formation materialsFiled 2002·Application pending·0 cites
- 1334US2005173803A1Interlayer adhesion promoter for low k materialsFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →