Inventor · disambiguated record
Annette Sanger
Also filed as: SAENGER ANNETTE · SANGER ANNETTE
12 granted patents·8 pending applications·115 citations·filing 2000–2015
90Inventor score
Top patents by PatentIndex Score
20 records- 0194US9660037B1Semiconductor wafer and methodINFINEON TECHNOLOGIES AUSTRIA AG·Filed 2015·Granted May 23, 2017·39 cites·19 claims
- 0287US6542054B2Acoustic mirror and method for producing the acoustic mirrorINFINEON TECHNOLOGIES AG·Filed 2002·Granted Apr 1, 2003·36 cites·20 claims
- 0364US6774005B2Method for fabricating a metal carbide layer and method for fabricating a trench capacitor containing a metal carbideINFINEON TECHNOLOGIES AG·Filed 2002·Granted Aug 10, 2004·9 cites·12 claims
- 0457US6686265B2Method of producing a capacitor electrode with a barrier structureINFINEON TECHNOLOGIES AG·Filed 2002·Granted Feb 3, 2004·6 cites·17 claims
- 0556US6998307B2Method for fabricating a storage capacitorINFINEON TECHNOLOGIES AG·Filed 2003·Granted Feb 14, 2006·4 cites·6 claims
- 0654US6987295B2Trench capacitor and method for fabricating the trench capacitorINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jan 17, 2006·6 cites·9 claims
- 0754US6916704B2Multiple deposition of metal layers for the fabrication of an upper capacitor electrode of a trench capacitorINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jul 12, 2005·6 cites·7 claims
- 0849US7199414B2Stress-reduced layer system for use in storage capacitorsINFINEON TECHNOLOGIES AG·Filed 2004·Granted Apr 3, 2007·3 cites·5 claims
- 0948US2006073659A1Method for fabricating a storage capacitorINFINEON TECHNOLOGIES AG·Filed 2005·Application pending·0 cites
- 1047US7129173B2Process for producing and removing a mask layerINFINEON TECHNOLOGIES AG·Filed 2003·Granted Oct 31, 2006·3 cites·8 claims
- 1144US7273790B2Method for fabricating trench capacitor with insulation collar electrically connected to substrate through buried contact, in particular, for a semiconductor memory cellINFINEON TECHNOLOGIES AG·Filed 2004·Granted Sep 25, 2007·2 cites·13 claims
- 1239US6797613B2Process for depositing WSix layers on a high topography with a defined stoichiometryINFINEON TECHNOLOGIES AG·Filed 2002·Granted Sep 28, 2004·1 cites·8 claims
- 1337US2005127421A1Semiconductor module having an insulation layer and method for fabricating a semiconductor module having an insulation layerINFINEON TECHNOLOGIES AG·Filed 2003·Application pending·0 cites
- 1436US7078309B2Methods for producing a structured metal layerINFINEON TECHNOLOGIES AG·Filed 2000·Granted Jul 18, 2006·0 cites·18 claims
- 1536US2005079679A1Trench capacitor and method for fabricating a trench capacitorINFINEON TECHNOLOGIES AG·Filed 2004·Application pending·0 cites
- 1636US2002158281A1Stress-reduced layer systemFiled 2002·Application pending·0 cites
- 1734US2001027798A1Polishing liquid for components, preferably wafers, process for producing polishing liquid and process for chemical mechanical polishing of componentsFiled 2001·Application pending·0 cites
- 1834US2002042208A1Polishing liquid and method for structuring metal oxidesFiled 2001·Application pending·0 cites
- 1934US2002017063A1Polishing liquid and process for patterning metals and metal oxidesFiled 2001·Application pending·0 cites
- 2033US2002190298A1Trench capacitor of a dram memory cell with a metallic collar region and a non-metallic buried strap to a selection transistorFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →