Inventor · disambiguated record
Andrea Schilp
Also filed as: SCHILP ANDREA · SCHIRMER JUERGEN DR
36 granted patents·2,259 citations·filing 1993–2004
98Inventor score
Files withBOSCH GMBH ROBERT35
Top patents by PatentIndex Score
36 records- 0199US5501893AMethod of anisotropically etching siliconBOSCH GMBH ROBERT·Filed 1993·Granted Mar 26, 1996·1.1k cites·26 claims
- 0294US5756901ASensor and method for manufacturing a sensorBOSCH GMBH ROBERT·Filed 1996·Granted May 26, 1998·94 cites·8 claims
- 0391US6214243B1Process for producing a speed of rotation coriolis sensorBOSCH GMBH ROBERT·Filed 1996·Granted Apr 10, 2001·78 cites·14 claims
- 0490US6284148B1Method for anisotropic etching of siliconBOSCH GMBH ROBERT·Filed 1998·Granted Sep 4, 2001·103 cites·9 claims
- 0589US5498312AMethod for anisotropic plasma etching of substratesBOSCH GMBH ROBERT·Filed 1994·Granted Mar 12, 1996·123 cites·10 claims
- 0688US6303512B1Anisotropic, fluorine-based plasma etching method for siliconBOSCH GMBH ROBERT·Filed 1998·Granted Oct 16, 2001·95 cites·25 claims
- 0787US6720268B1Method for anisotropic plasma etching of semiconductorsBOSCH GMBH ROBERT·Filed 2000·Granted Apr 13, 2004·38 cites·20 claims
- 0885US5616523AMethod of manufacturing sensorBOSCH GMBH ROBERT·Filed 1996·Granted Apr 1, 1997·59 cites·4 claims
- 0984US6008138AProcess for making micromechanical structuresBOSCH GMBH ROBERT·Filed 1997·Granted Dec 28, 1999·50 cites·12 claims
- 1083US7811941B1Device and method for etching a substrate using an inductively coupled plasmaBOSCH GMBH ROBERT·Filed 2000·Granted Oct 12, 2010·31 cites·30 claims
- 1181US6214161B1Method and apparatus for anisotropic etching of substratesBOSCH GMBH ROBERT·Filed 1998·Granted Apr 10, 2001·58 cites·17 claims
- 1280US6127273AProcess for anisotropic plasma etching of different substratesBOSCH GMBH ROBERT·Filed 1997·Granted Oct 3, 2000·59 cites·26 claims
- 1379US6531068B2Method of anisotropic etching of siliconBOSCH GMBH ROBERT·Filed 1999·Granted Mar 11, 2003·55 cites·18 claims
- 1478US5542558AMethod for manufacturing micro-mechanical components using selective anodization of siliconBOSCH GMBH ROBERT·Filed 1994·Granted Aug 6, 1996·36 cites·5 claims
- 1576US7166536B1Methods for plasma etching of siliconBOSCH GMBH ROBERT·Filed 2000·Granted Jan 23, 2007·19 cites·4 claims
- 1673US6200822B1Method for detecting the transition between different materials in semiconductor structuresBOSCH GMBH ROBERT·Filed 1998·Granted Mar 13, 2001·44 cites·6 claims
- 1772US7648611B2Plasma etching equipmentBOSCH GMBH ROBERT·Filed 2001·Granted Jan 19, 2010·15 cites·15 claims
- 1872US6926844B1Plasma etching method having pulsed substrate electrode powerBOSCH GMBH ROBERT·Filed 2000·Granted Aug 9, 2005·14 cites·38 claims
- 1970US6062082AMicromechanical acceleration or coriolis rotation-rate sensorBOSCH GMBH ROBERT·Filed 1996·Granted May 16, 2000·52 cites·20 claims
- 2069US6030850AMethod for manufacturing a sensorBOSCH GMBH ROBERT·Filed 1998·Granted Feb 29, 2000·24 cites·4 claims
- 2167US6899817B1Device and method for etching a substrate using an inductively coupled plasmaBOSCH GMBH ROBERT·Filed 2000·Granted May 31, 2005·11 cites·17 claims
- 2267US6720273B1Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma out put or adjusting the same upwardsBOSCH GMBH ROBERT·Filed 2000·Granted Apr 13, 2004·11 cites·16 claims
- 2366US6531031B1Plasma etching installationBOSCH GMBH ROBERT·Filed 1999·Granted Mar 11, 2003·18 cites·19 claims
- 2461US6911348B1Device and method for determining the lateral undercut of a structured surface layerBOSCH GMBH ROBERT·Filed 2000·Granted Jun 28, 2005·7 cites·27 claims
- 2560US7052623B1Method for processing silicon using etching processesBOSCH GMBH ROBERT·Filed 1999·Granted May 30, 2006·24 cites·32 claims
- 2658US5553506AForce sensor and a method for manufacturing a force sensorBOSCH GMBH ROBERT·Filed 1994·Granted Sep 10, 1996·16 cites·10 claims
- 2751US7201852B1Method for removing defects from silicon bodies by a selective etching processBOSCH GMBH ROBERT·Filed 2000·Granted Apr 10, 2007·4 cites·17 claims
- 2851US6340644B1Method for applying a protecting lacquer on a waferBOSCH GMBH ROBERT·Filed 1998·Granted Jan 22, 2002·15 cites·15 claims
- 2950US6515491B1Structural body having a stochastic surface patterning as well as a capacitive sensor having such a structural bodyBOSCH GMBH ROBERT·Filed 2000·Granted Feb 4, 2003·5 cites·16 claims
- 3050US6324910B1Method and device for measuring a physical variableBOSCH GMBH ROBERT·Filed 1997·Granted Dec 4, 2001·14 cites·11 claims
- 3150US5595940AMethod of producing micromechanical structuresBOSCH GMBH ROBERT·Filed 1995·Granted Jan 21, 1997·13 cites·9 claims
- 3249US6709546B2Device and method for etching a substrate by using an inductively coupled plasmaBOSCH GMBH ROBERT·Filed 2001·Granted Mar 23, 2004·2 cites·12 claims
- 3345US6558559B1Method of manufacturing micromechanical surface structures by vapor-phase etchingBOSCH GMBH ROBERT·Filed 1998·Granted May 6, 2003·10 cites·22 claims
- 3442US7094706B2Device and method for etching a substrate by using an inductively coupled plasmaBOSCH GMBH ROBERT·Filed 2004·Granted Aug 22, 2006·0 cites·10 claims
- 3541US5804457AMethod for manufacturing a force sensorFiled 1996·Granted Sep 8, 1998·7 cites·10 claims
- 3630US6012341AForce sensor having an adjustable distance between an operating point and a point of mechanical instabilityBOSCH GMBH ROBERT·Filed 1996·Granted Jan 11, 2000·3 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →