Inventor · disambiguated record
An-Ren Zi
Also filed as: ZI AN-REN
64 granted patents·36 pending applications·93 citations·filing 2004–2025
98Inventor score
Top patents by PatentIndex Score
100 records- 0197US12249507B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 11, 2025·2 cites·20 claims
- 0297US10073347B1Semiconductor method of protecting wafer from bevel contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Sep 11, 2018·19 cites·20 claims
- 0396US11054742B2EUV metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 6, 2021·4 cites·20 claims
- 0496US10866511B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·10 cites·20 claims
- 0594US11681226B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 20, 2023·2 cites·20 claims
- 0694US11300878B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 12, 2022·6 cites·20 claims
- 0794US10381481B1Multi-layer photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 13, 2019·8 cites·20 claims
- 0893US12222650B2Photoresist underlayer and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 11, 2025·2 cites·20 claims
- 0993US11822238B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 21, 2023·2 cites·20 claims
- 1093US11029602B2Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 8, 2021·4 cites·20 claims
- 1192US11971657B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 30, 2024·1 cites·20 claims
- 1292US2025362598A1Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1391US11269256B2Underlayer material for photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 8, 2022·2 cites·20 claims
- 1490US12253800B2EUV metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 18, 2025·1 cites·20 claims
- 1590US11456170B2Cleaning solution and method of cleaning waferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Sep 27, 2022·2 cites·20 claims
- 1689US12500084B2Semiconductor manufacturing apparatus and method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Dec 16, 2025·0 cites·20 claims
- 1789US2024377735A1Euv metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1887US12360456B2EUV metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 15, 2025·0 cites·20 claims
- 1987US12181798B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 2087US10866516B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 15, 2020·3 cites·20 claims
- 2187US10698317B2Underlayer material for photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 30, 2020·3 cites·20 claims
- 2287US10622211B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 14, 2020·4 cites·20 claims
- 2387US2025355349A1Photoresist composition and method of fabricating semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2486US12487527B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Dec 2, 2025·0 cites·20 claims
- 2585US12210286B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jan 28, 2025·0 cites·20 claims
- 2684US12009210B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 11, 2024·0 cites·20 claims
- 2784US11694896B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 4, 2023·1 cites·20 claims
- 2884US11036137B2Method for forming semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 15, 2021·1 cites·20 claims
- 2984US11016386B2Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 25, 2021·2 cites·20 claims
- 3083US12050404B2Photoresist with polar-acid-labile-groupTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 30, 2024·0 cites·20 claims
- 3183US10274847B2Humidity control in EUV lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·2 cites·20 claims
- 3283US2024377731A1Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3383US2025362612A1Resist underlayer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3482US11605538B2Protective composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 14, 2023·2 cites·20 claims
- 3582US10741410B2Material composition and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Aug 11, 2020·3 cites·20 claims
- 3682US2025364248A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3782US2025362607A1Dose reduction bottom anti-reflective coating for metallic photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3881US11681221B2EUV photoresist with low-activation-energy ligands or high-developer-solubility ligandsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 20, 2023·2 cites·20 claims
- 3979US12469692B2Cleaning solution and method of cleaning waferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 11, 2025·0 cites·20 claims
- 4079US10503070B2Photosensitive material and method of lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 10, 2019·2 cites·20 claims
- 4179US2023384668A1Photoresist composition and method for manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4278US12354874B2Method of manufacturing semiconductor devices and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 8, 2025·0 cites·20 claims
- 4378US11762296B2Method and apparatus of patterning a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 19, 2023·0 cites·20 claims
- 4477US2025068075A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4577US2025172879A1Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4676US11796918B2Underlayer material for photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 24, 2023·0 cites·20 claims
- 4776US2024371638A1Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4876US2025299955A1Method of manufacturing semiconductor devices and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4975US11215924B2Photoresist, developer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jan 4, 2022·1 cites·20 claims
- 5075US2025130499A1Resist underlayer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
Showing the top 50 of 100 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →