Inventor · disambiguated record
Asao Isobe
Also filed as: ISOBE ASAO
16 granted patents·373 citations·filing 1974–1993
95Inventor score
Top patents by PatentIndex Score
16 records- 0196US3989610APhotosensitive epoxy-acrylate resin compositionsHITACHI CHEMICAL CO LTD·Filed 1974·Granted Nov 2, 1976·64 cites·26 claims
- 0290US4698291APhotosensitive composition with 4-azido-2'-methoxychalconeHITACHI CHEMICAL CO LTD·Filed 1986·Granted Oct 6, 1987·61 cites·7 claims
- 0388US4499163ASoldering mask formed from a photosensitive resin composition and a photosensitive elementHITACHI CHEMICAL CO LTD·Filed 1983·Granted Feb 12, 1985·48 cites·28 claims
- 0484US4025348APhotosensitive resin compositionsHITACHI CHEMICAL CO LTD·Filed 1975·Granted May 24, 1977·41 cites·20 claims
- 0575US4722883AProcess for producing fine patternsHITACHI LTD·Filed 1986·Granted Feb 2, 1988·13 cites·8 claims
- 0668US5441849AMethod of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layerHITACHI LTD·Filed 1993·Granted Aug 15, 1995·30 cites·22 claims
- 0766US4554237APhotosensitive resin composition and method for forming fine patterns with said compositionHITACHI LTD·Filed 1982·Granted Nov 19, 1985·22 cites·17 claims
- 0865US4035189AImage forming curable resin compositionsHITACHI CHEMICAL CO LTD·Filed 1975·Granted Jul 12, 1977·19 cites·11 claims
- 0964US4295947APhoto-curable coating compositions for building materialsHITACHI CHEMICAL CO LTD·Filed 1979·Granted Oct 20, 1981·19 cites·2 claims
- 1056US4108666AMonofunctional monomer-containing photosensitive composition for photoresistHITACHI CHEMICAL CO LTD·Filed 1976·Granted Aug 22, 1978·11 cites·14 claims
- 1155US4154709AWater-dispersible epoxy modified alkyd resinsHITACHI CHEMICAL CO LTD·Filed 1978·Granted May 15, 1979·9 cites·16 claims
- 1249US5314783APhotosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compoundHITACHI CHEMICAL CO LTD·Filed 1992·Granted May 24, 1994·8 cites·10 claims
- 1343US4101364AMethod of an apparatus for producing film-laminated base platesHITACHI CHEMICAL CO LTD·Filed 1976·Granted Jul 18, 1978·15 cites·14 claims
- 1442US4801519AProcess for producing a pattern with negative-type photosensitive compositionHITACHI CHEMICAL CO LTD·Filed 1987·Granted Jan 31, 1989·6 cites·9 claims
- 1539US4513077AElectron beam or X-ray reactive image-formable resinous compositionHITACHI CHEMICAL CO LTD·Filed 1983·Granted Apr 23, 1985·5 cites·18 claims
- 1633US5215858APhotosensitive resin composition and pattern formation using the sameHITACHI CHEMICAL CO LTD·Filed 1989·Granted Jun 1, 1993·2 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →