Inventor · disambiguated record
Atsuko Hirata
Also filed as: HIRATA ATSUKO
3 granted patents·1 pending application·19 citations·filing 1999–2004
66Inventor score
Files withTOKYO OHKA KOGYO CO LTD3
Top patents by PatentIndex Score
4 records- 0154US6475694B2Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl groupTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Nov 5, 2002·4 cites·8 claims
- 0252US6187500B1Positive photoresist compositions and multilayer resist materials using sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Feb 13, 2001·13 cites·11 claims
- 0349US6939926B2Phenol novolak resin, production process thereof, and positive photoresist composition using the sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 6, 2005·2 cites·1 claims
- 0436US2001024762A1Phenol novolak resin, production process thereof, and positive photoresist composition using the sameFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →