Inventor · disambiguated record
Atsushi Otake
Also filed as: OTAKE ATSUSHI
12 granted patents·2 pending applications·76 citations·filing 2003–2023
89Inventor score
Top patents by PatentIndex Score
14 records- 0191US7595484B2Mass spectrometric method, mass spectrometric system, diagnosis system, inspection system, and mass spectrometric programHITACHI HIGH TECH CORP·Filed 2005·Granted Sep 29, 2009·16 cites·18 claims
- 0287US8003587B2Semiconductor process residue removal composition and processEKC TECHNOLOGY INC·Filed 2009·Granted Aug 23, 2011·16 cites·10 claims
- 0379US7825079B2Cleaning composition comprising a chelant and quaternary ammonium hydroxide mixtureEKC TECHNOLOGY INC·Filed 2009·Granted Nov 2, 2010·11 cites·5 claims
- 0477US6914239B2System for analyzing mass spectrometric dataHITACHI HIGH TECH CORP·Filed 2003·Granted Jul 5, 2005·13 cites·19 claims
- 0576US8502425B2Totally enclosed motorMATSUMOTO HIRONORI·Filed 2011·Granted Aug 6, 2013·4 cites·9 claims
- 0666US12260287B2Wireless tag reading deviceTOSHIBA TEC KK·Filed 2023·Granted Mar 25, 2025·0 cites·5 claims
- 0765US6957159B2System for analyzing compound structureHITACHI HIGH TECH CORP·Filed 2003·Granted Oct 18, 2005·6 cites·20 claims
- 0857US7426733B2Automatic program changing method for client program interfaceHITACHI LTD·Filed 2003·Granted Sep 16, 2008·6 cites·8 claims
- 0956US2023010208A1Bagging deviceTOSHIBA TEC KK·Filed 2022·Application pending·0 cites
- 1051US10864755B2Manual sheet jam clearance in printerTOSHIBA TEC KK·Filed 2019·Granted Dec 15, 2020·0 cites·18 claims
- 1150US9481855B2Cleaning composition and method for cleaning a semiconductor device substrate after chemical mechanical polishingEKC TECH INC·Filed 2013·Granted Nov 1, 2016·0 cites·4 claims
- 1250US7409591B2Method and system for managing programs for web service systemHITACHI LTD·Filed 2004·Granted Aug 5, 2008·2 cites·12 claims
- 1348US7500251B2Method and system for managing programs for web service systemHITACHI LTD·Filed 2004·Granted Mar 3, 2009·2 cites·6 claims
- 1430US2013053291A1Composition for cleaning substrates post-chemical mechanical polishingOTAKE ATSUSHI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →