Inventor · disambiguated record
Atsuyoshi Takenaka
Also filed as: TAKENAKA ATSUYOSHI
10 granted patents·1 pending application·148 citations·filing 1995–2025
89Inventor score
Top patents by PatentIndex Score
11 records- 0196US7838136B2Glass for information recording media substrate, glass substrate for magnetic disk and magnetic diskASAHI GLASS CO LTD·Filed 2008·Granted Nov 23, 2010·44 cites·8 claims
- 0295US8580411B2Glass for substrate, and glass substrateENDO JUN·Filed 2011·Granted Nov 12, 2013·37 cites·17 claims
- 0391US12071370B2Glass substrate, black matrix substrate, and display panelAGC INC·Filed 2021·Granted Aug 27, 2024·2 cites·9 claims
- 0473US8273262B2Method for etching glass substrateSAIJO YOSHITAKA·Filed 2010·Granted Sep 25, 2012·6 cites·11 claims
- 0570US5942454AHighly corrosion-resistant silicon carbide productASAHI GLASS CO LTD·Filed 1997·Granted Aug 24, 1999·26 cites·5 claims
- 0668US5628807AMethod for forming a glass product for a cathode ray tubeASAHI GLASS CO LTD·Filed 1995·Granted May 13, 1997·24 cites·4 claims
- 0765US8119268B2Glass for information recording media substrate, glass substrate for magnetic disk and magnetic diskNAKASHIMA TETSUYA·Filed 2010·Granted Feb 21, 2012·1 cites·16 claims
- 0859US6868699B2Glass forming moldASAHI GLASS CO LTD·Filed 2002·Granted Mar 22, 2005·5 cites·15 claims
- 0958US11495816B2Methods for producing liquid composition, polymer electrolyte membrane, catalyst layer, and membrane/electrode assemblyAGC INC·Filed 2017·Granted Nov 8, 2022·0 cites·8 claims
- 1057US2025368860A1Polishing agent, polishing method, method for manufacturing semiconductor component, and additive solution for polishing agentAGC INC·Filed 2025·Application pending·0 cites
- 1140US7025796B2Method for evaluating the quality of abrasive grains, polishing method and abrasive for polishing glassSEIMI CHEM KK·Filed 2003·Granted Apr 11, 2006·3 cites·15 claims
Join the waitlist — get patent alerts
Get an alert when Atsuyoshi Takenaka files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →