Inventor · disambiguated record
Baorui Yang
Also filed as: YANG BAORUI
31 granted patents·1 pending application·341 citations·filing 1997–2010
97Inventor score
Files withMICRON TECHNOLOGY INC32
Top patents by PatentIndex Score
32 records- 0188US6297879B1Inspection method and apparatus for detecting defects on photomasksMICRON TECHNOLOGY INC·Filed 1998·Granted Oct 2, 2001·85 cites·41 claims
- 0280US6933081B2Method for quartz bump defect repair with less substrate damageMICRON TECHNOLOGY INC·Filed 2002·Granted Aug 23, 2005·16 cites·54 claims
- 0378US7226723B2Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography systemMICRON TECHNOLOGY INC·Filed 2006·Granted Jun 5, 2007·3 cites·15 claims
- 0477US6534223B1Method of forming a circuitry fabrication mask having a subtractive alternating phase shift regionMICRON TECHNOLOGY INC·Filed 2000·Granted Mar 18, 2003·15 cites·36 claims
- 0575US7556897B2Methods of forming reticlesMICRON TECHNOLOGY INC·Filed 2008·Granted Jul 7, 2009·2 cites·10 claims
- 0675US7229725B2Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effectMICRON TECHNOLOGY INC·Filed 2006·Granted Jun 12, 2007·2 cites·29 claims
- 0773US6525317B1Reduction of charging effect and carbon deposition caused by electron beam devicesMICRON TECHNOLOGY INC·Filed 1998·Granted Feb 25, 2003·23 cites·23 claims
- 0872US6447962B2Method for repairing MoSi attenuated phase shift masksMICRON TECHNOLOGY INC·Filed 2001·Granted Sep 10, 2002·10 cites·2 claims
- 0971US7442472B2Methods of forming reticlesMICRON TECHNOLOGY INC·Filed 2004·Granted Oct 28, 2008·7 cites·12 claims
- 1070US6277526B1Method for repairing MoSi attenuated phase shift masksMICRON TECHNOLOGY INC·Filed 1998·Granted Aug 21, 2001·24 cites·56 claims
- 1169US6723476B2Methods of patterning materials; and photomasksMICRON TECHNOLOGY INC·Filed 2001·Granted Apr 20, 2004·9 cites·55 claims
- 1268US7826033B2Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effectMICRON TECHNOLOGY INC·Filed 2005·Granted Nov 2, 2010·1 cites·21 claims
- 1367US6103430AMethod for repairing bump and divot defects in a phase shifting maskMICRON TECHNOLOGY INC·Filed 1998·Granted Aug 15, 2000·21 cites·34 claims
- 1466US6114073AMethod for repairing phase shifting masksMICRON TECHNOLOGY INC·Filed 1998·Granted Sep 5, 2000·23 cites·41 claims
- 1565US6373976B1Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systemsMICRON TECHNOLOGY INC·Filed 1998·Granted Apr 16, 2002·16 cites·22 claims
- 1665US5798193AMethod and apparatus to accurately correlate defect coordinates between photomask inspection and repair systemsMICRON TECHNOLOGY INC·Filed 1997·Granted Aug 25, 1998·17 cites·6 claims
- 1764US6030731AMethod for removing the carbon halo caused by FIB clear defect repair of a photomaskMICRON TECHNOLOGY INC·Filed 1998·Granted Feb 29, 2000·21 cites·38 claims
- 1861US6106980AMethod and apparatus to accurately correlate defect coordinates between photomask inspection and repair systemsMICRON TECHNOLOGY INC·Filed 1998·Granted Aug 22, 2000·13 cites·23 claims
- 1960US7754399B2Methods of forming reticlesMICRON TECHNOLOGY INC·Filed 2009·Granted Jul 13, 2010·0 cites·5 claims
- 2059US7759660B2Electron beam lithography systemMICRON TECHNOLOGY INC·Filed 2006·Granted Jul 20, 2010·0 cites·20 claims
- 2159US6096459AMethod for repairing alternating phase shifting masksMICRON TECHNOLOGY INC·Filed 1998·Granted Aug 1, 2000·17 cites·31 claims
- 2258US7229742B2Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography systemMICRON TECHNOLOGY INC·Filed 2004·Granted Jun 12, 2007·2 cites·42 claims
- 2358US6291115B1Method for repairing bump and divot defects in a phase shifting maskMICRON TECHNOLOGY INC·Filed 2000·Granted Sep 18, 2001·4 cites·38 claims
- 2456US7977017B2Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effectMICRON TECHNOLOGY INC·Filed 2010·Granted Jul 12, 2011·0 cites·24 claims
- 2555US7910270B2Reticle constructionsMICRON TECHNOLOGY INC·Filed 2010·Granted Mar 22, 2011·0 cites·6 claims
- 2655US7432025B2Methods of forming reticlesMICRON TECHNOLOGY INC·Filed 2006·Granted Oct 7, 2008·0 cites·10 claims
- 2755US7258954B2Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effectMICRON TECHNOLOGY INC·Filed 2006·Granted Aug 21, 2007·0 cites·19 claims
- 2855US6037087AMethod to accurately correlate defect coordinates between photomask inspection and repair systemsMICRON TECHNOLOGY INC·Filed 1998·Granted Mar 14, 2000·10 cites·21 claims
- 2952US7569314B2Method for quartz bump defect repair with less substrate damageMICRON TECHNOLOGY INC·Filed 2006·Granted Aug 4, 2009·0 cites·17 claims
- 3044US2006183025A1Methods of forming mask patterns, methods of correcting feature dimension variation, microlithography methods, recording medium and electron beam exposure systemMICRON TECHNOLOGY INC·Filed 2005·Application pending·0 cites
- 3143US7147973B2Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effectMICRON TECHNOLOGY INC·Filed 2003·Granted Dec 12, 2006·0 cites·47 claims
- 3242US7309549B2Method for quartz bump defect repair with less substrate damageMICRON TECHNOLOGY INC·Filed 2004·Granted Dec 18, 2007·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →