Inventor · disambiguated record
Bernhard R. Liegl
Also filed as: LIEGL BERNHARD · LIEGL BERNHARD R
12 granted patents·8 pending applications·59 citations·filing 2001–2013
89Inventor score
Files withIBM9INFINEON TECHNOLOGIES AG3BRUNNER TIMOTHY A2BRUNNER TIMOTHY ALLAN1INFINEON TECHNOLOGIES CORP1
Top patents by PatentIndex Score
20 records- 0189US7239371B2Density-aware dynamic leveling in scanning exposure systemsIBM·Filed 2005·Granted Jul 3, 2007·12 cites·13 claims
- 0284US8239789B2System and method of predicting problematic areas for lithography in a circuit designBRUNNER TIMOTHY A·Filed 2011·Granted Aug 7, 2012·3 cites·8 claims
- 0382US7486097B2Proximity sensitive defect monitorIBM·Filed 2006·Granted Feb 3, 2009·10 cites·4 claims
- 0480US7176675B1Proximity sensitive defect monitorIBM·Filed 2005·Granted Feb 13, 2007·9 cites·9 claims
- 0575US9075944B2System and method of predicting problematic areas for lithography in a circuit designMENTOR GRAPHICS CORP·Filed 2013·Granted Jul 7, 2015·1 cites·14 claims
- 0675US7141338B2Sub-resolution sized assist featuresINFINEON TECHNOLOGIES AG·Filed 2002·Granted Nov 28, 2006·15 cites·12 claims
- 0774US8792080B2Method and system to predict lithography focus error using simulated or measured topographySAPP BRIAN CHRISTOPHER·Filed 2011·Granted Jul 29, 2014·2 cites·11 claims
- 0874US8484586B2System and method of predicting problematic areas for lithography in a circuit designBRUNNER TIMOTHY A·Filed 2012·Granted Jul 9, 2013·1 cites·20 claims
- 0974US8001495B2System and method of predicting problematic areas for lithography in a circuit designIBM·Filed 2008·Granted Aug 16, 2011·2 cites·10 claims
- 1064US8227180B2Photolithography focus improvement by reduction of autofocus radiation transmission into substrateBRUNNER TIMOTHY ALLAN·Filed 2011·Granted Jul 24, 2012·1 cites·9 claims
- 1160US2014071416A1Method and system to predict lithography focus error using simulated or measured topographyIBM·Filed 2013·Application pending·0 cites
- 1260US2014075399A1Method and system to predict lithography focus error using simulated or measured topographyIBM·Filed 2013·Application pending·0 cites
- 1360US2014075396A1Method and system to predict lithography focus error using simulated or measured topographyIBM·Filed 2013·Application pending·0 cites
- 1454US2009208865A1Photolithography focus improvement by reduction of autofocus radiation transmission into substrateIBM·Filed 2008·Application pending·0 cites
- 1548US6801314B2Alignment system and method using bright spot and box structureINFINEON TECHNOLOGIES AG·Filed 2001·Granted Oct 5, 2004·2 cites·11 claims
- 1641US2007287072A1Mask substrate depth adjustment to adjust for topography on surfaceLIEGL BERNHARD R·Filed 2006·Application pending·0 cites
- 1740US2007048668A1Wafer edge patterning in semiconductor structure fabricationIBM·Filed 2005·Application pending·0 cites
- 1834US2003147077A1Mask alignment methodINFINEON TECHNOLOGIES CORP·Filed 2002·Application pending·0 cites
- 1933US6784070B2Intra-cell mask alignment for improved overlayINFINEON TECHNOLOGIES AG·Filed 2002·Granted Aug 31, 2004·1 cites·17 claims
- 2029US2004121264A1Pattern transfer in device fabricationFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →