Inventor · disambiguated record
Berkem Özkaya
Also filed as: ÖZKAYA BERKEM
4 granted patents·6 pending applications·3 citations·filing 2017–2022
60Inventor score
Technology areasC25D
Top patents by PatentIndex Score
10 records- 0190US11214881B2Method for treatment of a chromium finish surfaceATOTECH DEUTSCHLAND GMBH·Filed 2021·Granted Jan 4, 2022·2 cites·15 claims
- 0279US10900140B2Method for electrolytically passivating an outermost chromium or outermost chromium alloy layer to increase corrosion resistance thereofATOTECH DEUTSCHLAND GMBH·Filed 2018·Granted Jan 26, 2021·1 cites·16 claims
- 0368US2023193496A1Method for electrodepositing a dark chromium layer on a substrate and substrate having at least one side fully covered with a dark chromium layerATOTECH DEUTSCHLAND GMBH & CO KG·Filed 2021·Application pending·0 cites
- 0468US2024011178A1Black plated substrateATOTECH DEUTSCHLAND GMBH & CO KG·Filed 2021·Application pending·0 cites
- 0561US11078585B2Method for treatment of a chromium finish surfaceATOTECH DEUTSCHLAND GMBH·Filed 2017·Granted Aug 3, 2021·0 cites·15 claims
- 0657US2024271308A1Method for adjusting the brightness l* of an electroplated chromium layerATOTECH DEUTSCHLAND GMBH & CO KG·Filed 2022·Application pending·0 cites
- 0753US2024026557A1Electroplating bath for depositing a black chromium layer and method for electroplating a black chromium layer on a substrateATOTECH DEUTSCHLAND GMBH & CO KG·Filed 2021·Application pending·0 cites
- 0853US2023193497A1Electroplating bath for depositing a black chromium layer, method for depositing, and substrate comprising such a layerATOTECH DEUTSCHLAND GMBH & CO KG·Filed 2021·Application pending·0 cites
- 0952US10961634B2Method for increasing corrosion resistance of a substrate comprising an outermost chromium alloy layerATOTECH DEUTSCHLAND GMBH·Filed 2018·Granted Mar 30, 2021·0 cites·15 claims
- 1050US2024271305A1Method for electrodepositing a dark chromium layer, substrate comprising same, and electroplating bath thereofATOTECH DEUTSCHLAND GMBH & CO KG·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →