Inventor · disambiguated record
Bhooshan Popere
Also filed as: POPERE BHOOSHAN · POPERE BHOOSHAN C
5 granted patents·5 pending applications·0 citations·filing 2015–2023
61Inventor score
Files withROHM & HAAS ELECT MAT5UNIV CALIFORNIA2DUPONT ELECTRONIC MAT INTERNATIONAL LLC1ROHM & HAAS ELECT MATERIALS KOREA LTD1VERDOX INC1
Top patents by PatentIndex Score
10 records- 0164US12393118B2Composition for photoresist underlayerROHM & HAAS ELECT MATERIALS KOREA LTD·Filed 2021·Granted Aug 19, 2025·0 cites·15 claims
- 0258US2024393689A1Compounds, monomers, polymers, photoresist compositions and pattern formation methodsDUPONT ELECTRONIC MAT INTERNATIONAL LLC·Filed 2023·Application pending·0 cites
- 0356US10818493B2Silicon-based hardmaskROHM & HAAS ELECT MAT·Filed 2018·Granted Oct 27, 2020·0 cites·11 claims
- 0453US2023103685A1Iodine-containing acid cleavable compounds, polymers derived therefrom, and photoresist compositionsROHM & HAAS ELECT MAT·Filed 2021·Application pending·0 cites
- 0553US2021387139A1Electroswing adsorption cell with patterned electrodes for separation of gas componentsVERDOX INC·Filed 2021·Application pending·0 cites
- 0652US10340144B2Doping of a substrate via a dopant containing polymer filmUNIV CALIFORNIA·Filed 2017·Granted Jul 2, 2019·0 cites·10 claims
- 0749US9576799B2Doping of a substrate via a dopant containing polymer filmUNIV CALIFORNIA·Filed 2015·Granted Feb 21, 2017·0 cites·9 claims
- 0849US2022091506A1Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2021·Application pending·0 cites
- 0948US10186424B2Silicon-based hardmaskROHM & HAAS ELECT MAT·Filed 2017·Granted Jan 22, 2019·0 cites·8 claims
- 1036US2020020538A1Patterned discrete nanoscale doping of semiconductors, methods of manufacture thereof and articles comprising the sameROHM & HAAS ELECT MAT·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →