Inventor · disambiguated record
Bo-Tsun Liu
Also filed as: LIU BO-TSUN
55 granted patents·2 pending applications·80 citations·filing 2013–2024
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD57
Top patents by PatentIndex Score
57 records- 0197US10656539B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 19, 2020·7 cites·20 claims
- 0297US10429729B2EUV radiation modification methods and systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·7 cites·20 claims
- 0397US10314154B1System and method for extreme ultraviolet source controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 4, 2019·13 cites·20 claims
- 0496US10524345B2Residual gain monitoring and reduction for EUV drive laserTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 31, 2019·9 cites·20 claims
- 0595US10928741B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 23, 2021·3 cites·20 claims
- 0695US10165664B1Apparatus for decontaminating windows of an EUV source moduleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 25, 2018·6 cites·20 claims
- 0793US11419203B2EUV radiation modification methods and systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 16, 2022·2 cites·20 claims
- 0893US11275318B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 15, 2022·2 cites·20 claims
- 0993US10917959B2EUV radiation modification methods and systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 9, 2021·3 cites·20 claims
- 1092US10338475B2Light source for lithography exposure processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 2, 2019·3 cites·20 claims
- 1191US11275301B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 15, 2022·3 cites·20 claims
- 1291US10718718B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 21, 2020·4 cites·20 claims
- 1389US11774844B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 3, 2023·1 cites·20 claims
- 1489US10980100B2Residual gain monitoring and reduction for EUV drive laserTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 13, 2021·2 cites·20 claims
- 1589US10976674B2Method for detecting EUV pellicle ruptureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 13, 2021·3 cites·20 claims
- 1689US10509324B2Light source for lithography exposure processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 17, 2019·2 cites·20 claims
- 1787US10429314B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·3 cites·20 claims
- 1887US2025093764A1Extreme ultraviolet maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1984US12181791B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 2084US12072633B2Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 27, 2024·0 cites·20 claims
- 2183US11392022B2Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 19, 2022·1 cites·20 claims
- 2283US10955762B2Radiation source apparatus and method for decreasing debris in radiation source apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 23, 2021·1 cites·20 claims
- 2382US10712676B2Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 14, 2020·1 cites·20 claims
- 2482US10495987B2Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 3, 2019·1 cites·20 claims
- 2582US2025106974A1Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2681US12193136B2Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jan 7, 2025·0 cites·20 claims
- 2780US12235594B2Method for performing lithography process, light source, and EUV lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 2880US10842009B2System and method for extreme ultraviolet source controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 17, 2020·1 cites·20 claims
- 2980US10477663B2Light source for lithography exposure processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 12, 2019·1 cites·20 claims
- 3079US11723141B2EUV radiation generation methods and systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 8, 2023·0 cites·20 claims
- 3179US11013097B2Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 18, 2021·1 cites·14 claims
- 3278US12347997B2Methods and systems for aligning master oscillator power amplifier systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 1, 2025·0 cites·20 claims
- 3378US12013641B2Method of reducing undesired light influence in extreme ultraviolet exposureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 18, 2024·0 cites·20 claims
- 3478US11720025B2Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 8, 2023·0 cites·20 claims
- 3577US11829082B2Radiation source for lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 28, 2023·0 cites·20 claims
- 3676US11703769B2Light source, EUV lithography system, and method for performing circuit layout patterning processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 18, 2023·0 cites·20 claims
- 3776US11531278B2EUV lithography system and method for decreasing debris in EUV lithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 3875US11483918B2Light source for lithography exposure processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 25, 2022·0 cites·20 claims
- 3974US11973302B2Methods and systems for aligning master oscillator power amplifier systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 30, 2024·0 cites·20 claims
- 4074US11792909B2Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 17, 2023·0 cites·20 claims
- 4172US11737200B2Residual gain monitoring and reduction for EUV drive laserTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 22, 2023·0 cites·20 claims
- 4271US11630393B2Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 18, 2023·0 cites·20 claims
- 4371US11333983B2Light source, EUV lithography system, and method for generating EUV radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 17, 2022·0 cites·20 claims
- 4471US11224115B2System and method for extreme ultraviolet source controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 11, 2022·0 cites·20 claims
- 4570US11092555B2EUV vessel inspection method and related systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 17, 2021·0 cites·20 claims
- 4667US11703762B2Method of reducing undesired light influence in extreme ultraviolet exposureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 18, 2023·0 cites·20 claims
- 4767US11269257B2Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 8, 2022·0 cites·20 claims
- 4867US10795264B2Light source for lithography exposure processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 6, 2020·0 cites·20 claims
- 4966US12302484B2Droplet generator and method of servicing extreme ultraviolet imaging toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 13, 2025·0 cites·20 claims
- 5066US10993308B2Light source for lithography exposure processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 27, 2021·0 cites·20 claims
Showing the top 50 of 57 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →