Inventor · disambiguated record
Byoung Ha Cho
Also filed as: CHO BYOUNG H · CHO BYOUNG-HA
4 granted patents·12 pending applications·168 citations·filing 2003–2022
75Inventor score
Top patents by PatentIndex Score
16 records- 0196US7077904B2Method for atomic layer deposition (ALD) of silicon oxide filmSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jul 18, 2006·129 cites·23 claims
- 0293US7435445B2Method for manufacturing semiconductor deviceMOOHAN CO LTD·Filed 2006·Granted Oct 14, 2008·39 cites·7 claims
- 0358US12436547B2Gas supply apparatus for substrate processing apparatusJUSUNG ENG CO LTD·Filed 2022·Granted Oct 7, 2025·0 cites·11 claims
- 0452US2016153086A1Substrate processing apparatusJUSUNG ENG CO LTD·Filed 2014·Application pending·0 cites
- 0551US2014166049A1Cleaning method of process chamberJUSUNG ENG CO LTD·Filed 2014·Application pending·0 cites
- 0651US2006090694A1Method for atomic layer deposition (ALD) of silicon oxide filmSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 0747US2019161861A1Apparatus for treating substrate and method for treating substrateJUSUNG ENG CO LTD·Filed 2019·Application pending·0 cites
- 0845US10233542B2Apparatus for treating substrate and method for treating substrateJUSUNG ENG CO LTD·Filed 2013·Granted Mar 19, 2019·0 cites·5 claims
- 0945US2011143035A1Thin Film Deposition System and Method for Depositing Thin FilmCHO BYOUNG HA·Filed 2010·Application pending·0 cites
- 1045US2011114130A1Cleaning method of process chamberJUSUNG ENG CO LTD·Filed 2010·Application pending·0 cites
- 1139US2004082171A1ALD apparatus and ALD method for manufacturing semiconductor deviceFiled 2003·Application pending·0 cites
- 1239US2023323533A1Substrate processing methodJUSUNG ENG CO LTD·Filed 2021·Application pending·0 cites
- 1334US2019333743A1Gas sprayer for substrate treatment device, and substrateJUSUNG ENG CO LTD·Filed 2017·Application pending·0 cites
- 1433US2019035607A1Substrate processing apparatusJUSUNG ENG CO LTD·Filed 2017·Application pending·0 cites
- 1529US2018226468A1Capacitor deposition apparatus and deposition method of dielectric film using sameJUSUNG ENG CO LTD·Filed 2016·Application pending·0 cites
- 1629US2018130674A1Apparatus and method for processing substrateJUSUNG ENG CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →