Inventor · disambiguated record
Byoung-Hak Hong
Also filed as: HONG BYOUNG-HAK
8 granted patents·5 pending applications·19 citations·filing 2015–2024
81Inventor score
Files withSAMSUNG ELECTRONICS CO LTD13
Top patents by PatentIndex Score
13 records- 0192US10177148B2Integrated circuit devices and methods of fabricating such devicesSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jan 8, 2019·8 cites·19 claims
- 0283US10804403B2Method of fabricating semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Oct 13, 2020·3 cites·14 claims
- 0381US10978453B2Integrated circuit devices and methods of fabricating such devicesSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Apr 13, 2021·2 cites·16 claims
- 0481US10361310B2Method of fabricating semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jul 23, 2019·3 cites·18 claims
- 0576US9773785B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Sep 26, 2017·3 cites·20 claims
- 0669US11894376B2Integrated circuit devices and methods of fabricating such devicesSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Feb 6, 2024·0 cites·19 claims
- 0758US2025318219A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0858US2025254922A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0952US2019035788A1Semiconductor devices and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 1046US2017162574A1Semiconductor devices and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 1145US9711505B2Semiconductor devices having dummy gate structure for controlling channel stressSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 18, 2017·0 cites·20 claims
- 1236US9331199B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted May 3, 2016·0 cites·20 claims
- 1333US2017033107A1Semiconductor device and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →