Inventor · disambiguated record
Byung Je Jung
Also filed as: JUNG BYUNG JE
4 granted patents·1 citations·filing 2015–2022
55Inventor score
Files withSAMSUNG ELECTRONICS CO LTD4
Top patents by PatentIndex Score
4 records- 0162US9606452B2Lithography metrology method for determining best focus and best dose and lithography monitoring method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Mar 28, 2017·1 cites·20 claims
- 0252US12306531B2Lithography and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted May 20, 2025·0 cites·20 claims
- 0349US10852644B2Optical proximity correction method and method of fabricating lithography mask by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Dec 1, 2020·0 cites·20 claims
- 0447US12396213B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Aug 19, 2025·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →