Inventor · disambiguated record
Cheol Kyu Bok
Also filed as: BOK CHEOL K · BOK CHEOL KYU
76 granted patents·13 pending applications·2,719 citations·filing 1989–2024
99Inventor score
Files withHYNIX SEMICONDUCTOR INC33HYUNDAI ELECTRONICS IND25SK HYNIX INC22DONGJIN SEMICHEM CO LTD3LEE KI LYOUNG3
Top patents by PatentIndex Score
89 records- 0199US7467632B2Method for forming a photoresist patternHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Dec 23, 2008·480 cites·4 claims
- 0299US6225020B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 1, 2001·508 cites·20 claims
- 0398US7238653B2Cleaning solution for photoresist and method for forming pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Jul 3, 2007·464 cites·23 claims
- 0498US6916594B2Overcoating composition for photoresist and method for forming photoresist pattern using the sameHYNIX SEMICONDUCTOR INC·Filed 2003·Granted Jul 12, 2005·128 cites·16 claims
- 0598US6316162B1Polymer and a forming method of a micro pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted Nov 13, 2001·482 cites·7 claims
- 0697US6866984B2ArF photoresist copolymersHYUNDAI ELECTRONICS IND·Filed 2003·Granted Mar 15, 2005·88 cites·10 claims
- 0795US8999848B2Method for forming fine pattern of semiconductor device using double spacer patterning technologySK HYNIX INC·Filed 2012·Granted Apr 7, 2015·23 cites·8 claims
- 0894US6632903B2Polymer-containing photoresist, and process for manufacturing the sameHYUNDAI ELECTRONICS IND·Filed 2001·Granted Oct 14, 2003·31 cites·7 claims
- 0992US9523917B2Methods of forming patternsSK HYNIX INC·Filed 2016·Granted Dec 20, 2016·9 cites·20 claims
- 1092US9202744B1Methods of fabricating interconnection structuresSK HYNIX INC·Filed 2014·Granted Dec 1, 2015·17 cites·20 claims
- 1192US7576009B2Method for forming fine pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Aug 18, 2009·21 cites·20 claims
- 1291US6132926AArF photoresist copolymersHYUNDAI ELECTRONICS IND·Filed 1997·Granted Oct 17, 2000·79 cites·40 claims
- 1388US9449840B1Methods of forming different sized patternsSK HYNIX INC·Filed 2015·Granted Sep 20, 2016·5 cites·20 claims
- 1488US7615497B2Forming fine pattern of semiconductor device using three mask layers and CMP of spin-on carbon layerHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Nov 10, 2009·13 cites·14 claims
- 1588US6599844B2Method and forming fine patterns of semiconductor devices using passivation layersHYUNDAI ELECTRONICS IND·Filed 2001·Granted Jul 29, 2003·40 cites·17 claims
- 1687US7303858B2Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Dec 4, 2007·9 cites·26 claims
- 1786US6312865B1Semiconductor device using polymer-containing photoresist, and process for manufacturing the sameHYUNDAI ELECTRONICS IND·Filed 1998·Granted Nov 6, 2001·24 cites·12 claims
- 1884US8999862B1Methods of fabricating nano-scale structures and nano-scale structures fabricated therebySK HYNIX INC·Filed 2014·Granted Apr 7, 2015·7 cites·20 claims
- 1983US7776747B2Semiconductor device and method for forming pattern in the sameHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Aug 17, 2010·8 cites·17 claims
- 2082US7112840B2Semiconductor memory device and method for fabricating the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Sep 26, 2006·10 cites·6 claims
- 2181US9911605B2Methods of forming fine patternsSK HYNIX INC·Filed 2016·Granted Mar 6, 2018·3 cites·8 claims
- 2280US9354519B2Methods of forming patternsSK HYNIX INC·Filed 2015·Granted May 31, 2016·3 cites·20 claims
- 2380US8962491B2Methods of fabricating semiconductor devices and semiconductor devices fabricated therebySK HYNIX INC·Filed 2013·Granted Feb 24, 2015·4 cites·20 claims
- 2480US8202683B2Method for forming pattern of semiconductor deviceLEE KI LYOUNG·Filed 2009·Granted Jun 19, 2012·7 cites·20 claims
- 2579US6265130B1Photoresist polymers of carboxyl-containing alicyclic compoundsHYUNDAI ELECTRONICS IND·Filed 1999·Granted Jul 24, 2001·16 cites·15 claims
- 2677US9478436B1Methods for forming patterns in honeycomb arraySK HYNIX INC·Filed 2016·Granted Oct 25, 2016·2 cites·20 claims
- 2776US7550384B2Semiconductor device and method for forming pattern in the sameHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Jun 23, 2009·5 cites·22 claims
- 2875US6248847B1Copolymer resin, preparation thereof, and photoresist using the sameHYUNDAI ELECTRONICS IND·Filed 1998·Granted Jun 19, 2001·12 cites·6 claims
- 2975US6235448B1Photoresist monomers, polymers thereof, and photoresist compositions containing the sameHYUNDAI ELECTRONICS IND·Filed 1999·Granted May 22, 2001·32 cites·23 claims
- 3073US7494935B2Method for forming fine pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Feb 24, 2009·4 cites·20 claims
- 3173US7462439B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Dec 9, 2008·3 cites·22 claims
- 3273US7381519B2Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Jun 3, 2008·4 cites·22 claims
- 3371US9257281B2Methods of fabricating a pattern using the block co-polymer materialsSK HYNIX INC·Filed 2014·Granted Feb 9, 2016·2 cites·20 claims
- 3471US7989145B2Method for forming fine pattern of semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Aug 2, 2011·3 cites·18 claims
- 3571US7534548B2Polymer for immersion lithography and photoresist compositionHYNIX SEMICONDUCTOR INC·Filed 2005·Granted May 19, 2009·2 cites·18 claims
- 3670US9082718B2Fine pattern structures having block co-polymer materialsSK HYNIX INC·Filed 2014·Granted Jul 14, 2015·2 cites·16 claims
- 3770US8481429B2Method of manufacturing semiconductor deviceKIM JAE HEON·Filed 2012·Granted Jul 9, 2013·3 cites·17 claims
- 3869US7288364B2Top anti-reflective coating composition and method for pattern formation of semiconductor device using the sameHYNIX SEMICONDUCTOR INC·Filed 2005·Granted Oct 30, 2007·3 cites·39 claims
- 3965US9245796B1Methods of fabricating interconnection structuresSK HYNIX INC·Filed 2015·Granted Jan 26, 2016·1 cites·15 claims
- 4064US9190274B2Methods of fabricating fine patternsSK HYNIX INC·Filed 2013·Granted Nov 17, 2015·1 cites·20 claims
- 4164US6143463AMethod and photoresist using a photoresist copolymerHYUNDAI ELECTRONICS IND·Filed 1997·Granted Nov 7, 2000·28 cites·6 claims
- 4263US6369181B1Copolymer resin, preparation thereof, and photoresist using the sameHYUNDAI ELECTRONICS IND·Filed 1998·Granted Apr 9, 2002·22 cites·5 claims
- 4362US8003540B2Method for manufacturing semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2007·Granted Aug 23, 2011·1 cites·13 claims
- 4460US6165672AMaleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resinHYUNDAI ELECTRONICS IND·Filed 1998·Granted Dec 26, 2000·24 cites·31 claims
- 4560US4994409AMethod for manufacturing a trench capacitor using a photoresist etch back processHYUNDAI ELECTRONICS IND·Filed 1989·Granted Feb 19, 1991·27 cites·7 claims
- 4658US7838201B2Method for manufacturing a semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2009·Granted Nov 23, 2010·0 cites·18 claims
- 4758US7022458B2Photoresist polymer and photoresist composition containing the sameDONGJIN SEMICHEM CO LTD·Filed 2003·Granted Apr 4, 2006·5 cites·20 claims
- 4857US7550362B2Method for manufacturing semiconductor deviceHYNIX SEMICONDUCTOR INC·Filed 2006·Granted Jun 23, 2009·1 cites·9 claims
- 4956US10504726B2Nano-scale structuresSK HYNIX INC·Filed 2017·Granted Dec 10, 2019·0 cites·4 claims
- 5055US5888698APhotoresist film for deep ultra violet and method for forming photoresist film pattern using the sameHYUNDAI ELECTRONICS IND·Filed 1997·Granted Mar 30, 1999·9 cites·6 claims
Showing the top 50 of 89 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Cheol Kyu Bok files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →