Inventor · disambiguated record
Chao Chen
Also filed as: CHEN CHAO · CHEN CHAO-MU
6 granted patents·6 pending applications·1 citations·filing 2011–2025
65Inventor score
Files withCONTEMPORARY AMPEREX TECHNOLOGY CO LTD3PLANSEE SHANGHAI HIGH PERFORMANCE MAT LTD3CONTEMPORARY AMPEREX TECHNOLOGY HONG KONG LTD2CHEN CHAO-MU1DEEPINFAR OCEAN TECH INC1
Top patents by PatentIndex Score
12 records- 0194US12416579B1Misalignment detection method and apparatus for battery tabs, and battery electrode plate winding systemCONTEMPORARY AMPEREX TECHNOLOGY CO LTD·Filed 2025·Granted Sep 16, 2025·1 cites·9 claims
- 0272US12342061B2Camera apparatus and winder systemCONTEMPORARY AMPEREX TECHNOLOGY HONG KONG LTD·Filed 2022·Granted Jun 24, 2025·0 cites·20 claims
- 0364US2024223741A1Camera pixel calibration apparatus and winding deviceCONTEMPORARY AMPEREX TECHNOLOGY CO LTD·Filed 2023·Application pending·0 cites
- 0463US12501140B2Image acquisition apparatus and defect detection system of electrode plateCONTEMPORARY AMPEREX TECHNOLOGY HONG KONG LTD·Filed 2023·Granted Dec 16, 2025·0 cites·12 claims
- 0562US11973193B2Battery winding method, battery winding system, battery and electrical deviceCONTEMPORARY AMPEREX TECHNOLOGY CO LTD·Filed 2023·Granted Apr 30, 2024·0 cites·7 claims
- 0651US2025283208A1Sputtering target and method for manufacturing a sputtering targetPLANSEE SHANGHAI HIGH PERFORMANCE MAT LTD·Filed 2025·Application pending·0 cites
- 0749US2023264362A1Underwater cleaning robot systemDEEPINFAR OCEAN TECH INC·Filed 2021·Application pending·0 cites
- 0847US2023270310A1Cleaning apparatus and cleaning robot systemECOVACS ROBOTICS CO LTD·Filed 2021·Application pending·0 cites
- 0941US12486563B2Sputtering targetPLANSEE SHANGHAI HIGH PERFORMANCE MAT LTD·Filed 2022·Granted Dec 2, 2025·0 cites·8 claims
- 1040US9366521B2Apparatus and method for measuring the erosion depth of a sputtering targetSHENZHEN CHINA STAR OPTOELECT·Filed 2013·Granted Jun 14, 2016·0 cites·16 claims
- 1140US2012273349A1Glass Substrate Trolley Handling SystemCHEN CHAO-MU·Filed 2011·Application pending·0 cites
- 1239US2024263296A1Sputtering target and method for manufacturing the samePLANSEE SHANGHAI HIGH PERFORMANCE MAT LTD·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →