Inventor · disambiguated record
Chia-Jen Chen
Also filed as: CHEN CHIA-JEN
90 granted patents·12 pending applications·1,257 citations·filing 1983–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD67TAIWAN SEMICONDUCTOR MFG15LEE HSIN-CHANG5CHEN CHIA-JEN3LIN MING-FUNG2
Top patents by PatentIndex Score
102 records- 0198US9869928B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 16, 2018·128 cites·20 claims
- 0298US9256123B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 9, 2016·365 cites·20 claims
- 0398US8709682B2Mask and method for forming the maskCHEN CHIA-JEN·Filed 2012·Granted Apr 29, 2014·82 cites·20 claims
- 0498US8679707B2Method of fabricating a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Mar 25, 2014·86 cites·20 claims
- 0597US11860532B2Photomask including fiducial mark and method of making a semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 2, 2024·2 cites·20 claims
- 0697US11855085B2Semiconductor structure cutting process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 26, 2023·2 cites·20 claims
- 0797US11422466B2Photomask including fiducial mark and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 23, 2022·3 cites·20 claims
- 0897US8877409B2Reflective mask and method of making sameHSU PEI-CHENG·Filed 2012·Granted Nov 4, 2014·324 cites·20 claims
- 0996US11687006B2Method of manufacturing photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 27, 2023·2 cites·20 claims
- 1095US11294292B2Particle removing assembly and method of cleaning mask for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·3 cites·20 claims
- 1195US9360749B2Pellicle structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 7, 2016·10 cites·21 claims
- 1294US8765330B2Phase shift mask for extreme ultraviolet lithography and method of fabricating sameSHIH CHIA-TSUNG·Filed 2012·Granted Jul 1, 2014·85 cites·20 claims
- 1393US8912610B2Structure and method for MOSFETS with high-K and metal gate structureLIN JR JUNG·Filed 2012·Granted Dec 16, 2014·22 cites·16 claims
- 1492US12032302B2Method and device for cleaning substratesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 9, 2024·2 cites·20 claims
- 1592US9244341B2Photomask and method for forming the sameTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jan 26, 2016·4 cites·20 claims
- 1692US8589828B2Reduce mask overlay error by removing film deposited on blank of maskLEE HSIN-CHANG·Filed 2012·Granted Nov 19, 2013·29 cites·20 claims
- 1791US10295899B2Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 21, 2019·4 cites·20 claims
- 1891US9213232B2Reflective mask and method of making sameTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 15, 2015·5 cites·20 claims
- 1990US12298673B2Method of manufacturing photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted May 13, 2025·0 cites·20 claims
- 2090US11042084B2Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 22, 2021·3 cites·20 claims
- 2190US9128384B2Method of forming a patternTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Sep 8, 2015·9 cites·16 claims
- 2290US2025126883A1Semiconductor Structure Cutting Process and Structures Formed TherebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2389US11815804B2EUV mask blank and method of making EUV mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 14, 2023·1 cites·20 claims
- 2489US11698592B2Particle removing assembly and method of cleaning mask for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 11, 2023·1 cites·20 claims
- 2589US10867998B1Semiconductor structure cutting process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 15, 2020·3 cites·20 claims
- 2688US9664999B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 30, 2017·2 cites·20 claims
- 2788US2025362584A1Lithography mask having high extinction coefficient absorber and related systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2887US12339582B2Photomask including fiducial mark and method of making a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 24, 2025·0 cites·20 claims
- 2987US12218130B2Semiconductor structure cutting process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 4, 2025·0 cites·20 claims
- 3087US11619875B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 4, 2023·1 cites·20 claims
- 3187US11029593B2Lithography mask with a black border regions and method of fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 8, 2021·2 cites·20 claims
- 3287US8916482B2Method of making a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Dec 23, 2014·5 cites·12 claims
- 3386US11899357B2Lithography maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 13, 2024·1 cites·20 claims
- 3486US11740547B2Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effectTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 29, 2023·1 cites·20 claims
- 3586US10866504B2Lithography mask with a black border region and method of fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·2 cites·20 claims
- 3686US2024385506A1Euv photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3785US12038693B2Method of manufacturing photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 16, 2024·0 cites·20 claims
- 3885US10996553B2Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 4, 2021·3 cites·20 claims
- 3985US7906252B2Multiple resist layer phase shift mask (PSM) blank and PSM formation methodTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Mar 15, 2011·9 cites·20 claims
- 4084US12147154B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 19, 2024·0 cites·20 claims
- 4184US11435660B2Photomask and method of fabricating a photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 6, 2022·2 cites·20 claims
- 4283US12265322B2EUV mask blank and method of making EUV mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 1, 2025·0 cites·20 claims
- 4382US8651979B2Sports training deviceCHEN CHIA-JEN·Filed 2011·Granted Feb 18, 2014·13 cites·7 claims
- 4482US2024385111A1Mask characterization methods and apparatusesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4582US2024379820A1Air spacer and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4682US2025328088A1Method and device for cleaning substratesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4781US12393129B2Method and device for cleaning substratesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Aug 19, 2025·0 cites·20 claims
- 4881US12085866B2Particle removing assembly and method of cleaning mask for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·0 cites·20 claims
- 4980US12130548B2Extreme ultraviolet mask with reduced wafer neighboring effectTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 5080US12107149B2Air spacer and method of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 1, 2024·0 cites·20 claims
Showing the top 50 of 102 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →