Inventor · disambiguated record
Chih-Cheng Chin
Also filed as: CHIN CHIH-CHENG
9 granted patents·2 pending applications·88 citations·filing 2001–2008
84Inventor score
Top patents by PatentIndex Score
11 records- 0195US7383530B2System and method for examining mask pattern fidelityTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 3, 2008·27 cites·12 claims
- 0293US6982135B2Pattern compensation for stitchingTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jan 3, 2006·54 cites·18 claims
- 0363US7697114B2Method and apparatus for compensated illumination for advanced lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Apr 13, 2010·1 cites·26 claims
- 0458US7722997B2Holographic reticle and patterning methodTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted May 25, 2010·0 cites·13 claims
- 0557US7312021B2Holographic reticle and patterning methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Dec 25, 2007·3 cites·15 claims
- 0648US7005219B2Defect repair method employing non-defective pattern overlay and photoexposureTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Feb 28, 2006·2 cites·20 claims
- 0748US6653029B2Dual-focused ion beams for semiconductor image scanning and mask repairTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Nov 25, 2003·1 cites·15 claims
- 0846US7316872B2Etching bias reductionTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Jan 8, 2008·0 cites·13 claims
- 0944US7651824B1Method for compensating critical dimension variations in photomasksNANYA TECHNOLOGY CORP·Filed 2008·Granted Jan 26, 2010·0 cites·7 claims
- 1041US2004225488A1System and method for examining mask pattern fidelityFiled 2003·Application pending·0 cites
- 1137US2004265704A1Multiple-exposure defect eliminationTAIWAN SEMICONDUCTOR MFG·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →