Inventor · disambiguated record
Chin-Wook Chung
Also filed as: CHUNG CHIN W · CHUNG CHIN WOOK
9 granted patents·6 pending applications·21 citations·filing 2005–2023
81Inventor score
Files withIUCF HYU3SAMSUNG ELECTRONICS CO LTD2CHUNG CHIN-WOOK1INDUSTRY-UNIV COOP FOUND HANYANG UNIV1INDUSTRY-UNIV COOPERATION FOUNDATION HANYANG UNIV1
Top patents by PatentIndex Score
15 records- 0180US7696758B2Plasma diagnostic apparatus and methodKOREA RES INST OF STANDARDS·Filed 2008·Granted Apr 13, 2010·8 cites·12 claims
- 0279US9566596B2Spray pumpYONWOO CO LTD·Filed 2012·Granted Feb 14, 2017·8 cites·4 claims
- 0371US9754770B2Method and apparatus of diagnosing plasma in plasma spaceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Sep 5, 2017·2 cites·19 claims
- 0463US8207470B2Apparatus for generating remote plasmaJEON HYEONG-TAG·Filed 2009·Granted Jun 26, 2012·2 cites·17 claims
- 0555US8343309B2Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jan 1, 2013·1 cites·15 claims
- 0654US2024177972A1Method for etching atomic layerRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2023·Application pending·0 cites
- 0752US2024395516A1Plasma state variable specifying method including a double probe having an asymmetric area, a plasma state variable specifying apparatus including a double probe having an asymmetric area, and a plasma generating apparatus including the sameIUCF HYU·Filed 2022·Application pending·0 cites
- 0846US9437399B2Plasma equipmentINDUSTRY-UNIV COOP FOUND HANYANG UNIV·Filed 2013·Granted Sep 6, 2016·0 cites·12 claims
- 0946US2007193515A1Apparatus for generating remote plasmaUNIV SOGANG IND UNIV COOP FOUN·Filed 2007·Application pending·0 cites
- 1045US9837825B2Transmitter for transmitting wireless powerINDUSTRY-UNIV COOPERATION FOUNDATION HANYANG UNIV·Filed 2013·Granted Dec 5, 2017·0 cites·7 claims
- 1143US12406834B2Substrate processing apparatus and substrate processing methodIUCF HYU·Filed 2020·Granted Sep 2, 2025·0 cites·5 claims
- 1242US12469679B2Substrate treating apparatusIUCF HYU·Filed 2020·Granted Nov 11, 2025·0 cites·2 claims
- 1342US2014190635A1Plasma chamber and apparatus for treating substratePSK INC·Filed 2013·Application pending·0 cites
- 1442US2010282711A1Process monitoring apparatus and methodCHUNG CHIN-WOOK·Filed 2008·Application pending·0 cites
- 1536US2006061287A1Plasma processing apparatus and control method thereofJEON SANG J·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →